Multi-tier Die Stacking Through Collective Die-to-Wafer Hybrid bonding

By Brewer Science - 23 Jul, 2024 - Comments: 0

A technical paper titled "Multi-tier Die Stacking Through Collective Die-to-Wafer Hybrid bonding" was published by researchers at imec, Brewer Science and SUSS MicroTec Lithography GmbH. Abstract "A collective die-to-wafer bonding flow is extended beyond the N=2 tier to the N=3 and N=4 tier by collectively bonding multiple layers of dies on top of a target wafer. The N=2 die-level is show... » read more

Building A Sustainable And Diverse Semiconductor Workforce: Insights From ASMC 2024 Panel Discussion

By Krish Raghunath - 23 Jul, 2024 - Comments: 0

As the semiconductor industry works to attract talent to overcome its labor shortage, governments, educators, and the private sector must collaborate to make industry career opportunities more accessible for prospective employees. This concept provided the framework for a panel discussion during SEMI’s 35th annual Advanced Semiconductor Manufacturing Conference (ASMC) that took place in Alba... » read more

Intel Vs. Samsung Vs. TSMC

By Ed Sperling - 15 Jul, 2024 - Comments: 3

The three leading-edge foundries — Intel, Samsung, and TSMC — have started filling in some key pieces in their roadmaps, adding aggressive delivery dates for future generations of chip technology and setting the stage for significant improvements in performance with faster delivery time for custom designs. Unlike in the past, when a single industry roadmap dictated how to get to the next... » read more

Controlling Warpage In Advanced Packages

By Laura Peters - 24 Jun, 2024 - Comments: 1

Warpage is becoming a serious concern in advanced packaging, where a heterogeneous mix of materials can cause uneven stress points during assembly and packaging, and under real workloads in the field. Warpage plays a critical role in determining whether an advanced package can be assembled successfully and meet long-term reliability targets. New advances, such as molding compounds with impro... » read more

Development Of Capacitance Measurement Unit For A System Level Tester

By BeomSeok Kim - 20 Jun, 2024 - Comments: 0

By BeomSeok Kim, SeongHwan Kim, Unki Kim, SeongBeom Cho, DongHo Seo, and SangHun Yun In back-end semiconductor processing it is important to improve the performance of semiconductors due to the limitations of miniaturization in front-end processes. To achieve this goal, the industry continues to invest in back-end processing and competition is fierce in advanced technology of back-end proces... » read more

Single Vs. Multi-Patterning Advancements For EUV

By Gregory Haley - 20 Jun, 2024 - Comments: 0

As semiconductor devices become more complex, so do the methods for patterning them. Ever-smaller features at each new node require continuous advancements in photolithography techniques and technologies. While the basic lithography process hasn’t changed since the founding of the industry — exposing light through a reticle onto a prepared silicon wafer — the techniques and technology ... » read more

Virtual Exploration Of Novel Vertical DRAM Architectures

By Taeyon (TY) Oh - 20 Jun, 2024 - Comments: 0

In this article, we demonstrate a pathfinding technique for a novel Vertical DRAM technology. First, we identify important process parameters (defined by current semiconductor production equipment capabilities) that strongly impact yield. By using a virtual model, we then perform experimental optimization of the Vertical DRAM device across specific target ranges, to help predict and improve the... » read more

Applying Machine Learning To Accelerate TCAD Calibration

By Dwight Hunter - 20 Jun, 2024 - Comments: 0

TCAD models are the fundamental building blocks for the semiconductor industry. Whether it is a new process node or a new multi-billion dollar fab, accurate TCAD models must be developed and calibrated before they can be deployed in technology development. While TCAD models have been around for (many) decades, their complexity is growing exponentially, as is the demands placed on the R&D en... » read more

Precise Control Needed For Copper Plating And CMP

By Anne Meixner - 20 Jun, 2024 - Comments: 0

Chipmakers are relying on machine learning for electroplating and wafer cleaning at leading-edge process nodes, augmenting traditional fault detection/classification and statistical process control in order to extend the usefulness of copper interconnects. Copper is well understood and easy to work with, but it is running out of steam. At 5nm and below, copper plating tools are struggling to... » read more

AI: Great, But Somehow Still Not Very Good

By Charlie Parker - 20 Jun, 2024 - Comments: 0

In an invited presentation at CS Mantech 2024, Charlie Parker, senior machine learning engineer at Tignis, provides context for the AI hype cycle with a high-level overview of machine learning concepts, then explores how the technology fits into the fab, from inventory management to institutional knowledge capture, but warns that it is worth being aware of the ways in which machine learning mod... » read more

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Multi-tier Die Stacking Through Collective Die-to-Wafer Hybrid bonding

Building A Sustainable And Diverse Semiconductor Workforce: Insights From ASMC 2024 Panel Discussion

Intel Vs. Samsung Vs. TSMC

Controlling Warpage In Advanced Packages

Development Of Capacitance Measurement Unit For A System Level Tester

Single Vs. Multi-Patterning Advancements For EUV

Virtual Exploration Of Novel Vertical DRAM Architectures

Applying Machine Learning To Accelerate TCAD Calibration

Precise Control Needed For Copper Plating And CMP

AI: Great, But Somehow Still Not Very Good

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