A look at the impact of layout design style on simultaneous SMO of logic and SRAM.
Source Mask Optimization (SMO) is required to extend the use of 193 water immersion lithography to the 22nm technology node. Although SMO is being aggressively pushed in volume production the layout design implications of this technology have not been openly discussed. In this paper, the impact of layout design style on simultaneous SMO of Logic and SRAM is studied. In particular the improvements in pattern control offered by the pdBRIX template-based design methodology and its compliance with ASML’s Tachycon SMO and Flexray source will be highlighted.
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