A new technical paper titled “Sensitivity and contrast of indium nitrate hydrate resist evaluated by low-energy electron beam and extreme ultraviolet exposure” was published by researchers at UT Dallas.
“We evaluate the sensitivity and contrast of indium nitrate resists by analyzing dose curves collected using electron beam lithography (EBL) and extreme ultraviolet (EUV) exposure, ” states the paper.
Find the technical paper here. Published January 2024.
Valdez, Marisol, Alexandra Joshi-Imre, Benius J. Dunn, Mariana Herrera Lara, and Julia WP Hsu. “Sensitivity and contrast of indium nitrate hydrate resist evaluated by low-energy electron beam and extreme ultraviolet exposure.” Journal of Micro/Nanopatterning, Materials, and Metrology 24, no. 1 (2025): 014601-014601.
https://doi.org/10.1117/1.JMM.24.1.014601
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