The Week In Review: July 22

By Mark LaPedus - 22 Jul, 2013 - Comments: 0

By Mark LaPedus ASML Holding has been under pressure to bring extreme ultraviolet (EUV) lithography into mass production. EUV is still delayed. Now, in their latest roadmaps, leading-edge chipmakers are counting on ASML’s 300mm EUV scanner for insertion at the 10nm node. Yet, at the same time, ASML also is working on a 450mm version of the EUV tool. “EUV (on 300mm) is a higher priority th... » read more

Changes And Challenges

By Ed Sperling - 18 Jul, 2013 - Comments: 0

At 130nm, the shift to copper interconnects and 300mm wafer sizes was considered to be the most difficult transition in its long and incredibly efficient history. The next chapter will be even tougher. It’s not that change is a foreign concept to semiconductor design and manufacturing. In fact, it’s probably the only constant over the past 50 years. But in the past, those changes tended ... » read more

Experts At The Table: 450mm Fab And Facilities Challenges

By Mark LaPedus - 18 Jul, 2013 - Comments: 0

By Mark LaPedus Semiconductor Manufacturing & Design sat down to discuss future 450mm fab and facilities challenges with Gerald Goff, director of the project management office for fab design and construction at GlobalFoundries; Joe Cestari, president of Total Facility Solutions; Ivo Raaijmakers, chief technology officer of ASM International; and Michael Brain, senior director of the Fab S... » read more

High NA EUV Litho May Require Larger Photomask Size

By Jeff Chappell - 18 Jul, 2013 - Comments: 0

By Jeff Chappell With extreme ultraviolet lithography (EUV) potentially being used in pilot production in a few years, it raises the question of larger photomasks sizes—will the industry need them, and if so, when? While there has been discussion of late about the possible need to transition to a larger mask size, veterans of the mask business may feel it's déjà vu all over again. Back... » read more

450mm: Out Of Sync

By Mark LaPedus - 18 Jul, 2013 - Comments: 0

By Mark LaPedus The IC industry has been talking about it for ages, but vendors are finally coming to terms with a monumental shift in the business. The vast changes involve a pending and critical juncture, where the 450mm wafer size transition, new device architectures and other technologies will likely converge at or near the same time. In one possible scenario, 450mm fabs are projected ... » read more

Foundry Talk

By Ed Sperling - 07 Jul, 2013 - Comments: 0

GlobalFoundries CEO Ajit Manocha sounds off on Foundry 2.0, 450mm wafers, lithography challenges, stacked die, the Internet of Things and the rush to the next process node. [youtube vid=WfjtlZkCi0w] » read more

Inside A 450mm Metrology Consortium

By Mark LaPedus - 20 Jun, 2013 - Comments: 0

By Mark LaPedus Semiconductor Manufacturing & Design sat down to discuss 450mm metrology challenges with Menachem Shoval, a former manufacturing executive at Intel and chairman of the Metro450 consortium. The Israeli-based consortium is developing metrology technology for the next-generation, 450mm wafer size. The group consists of Intel, Applied Materials, Jordan Valley, Nanomotion, Nov... » read more

Consortium Mania Sweeps 450mm Landscape

By Mark LaPedus - 20 Jun, 2013 - Comments: 0

By Mark LaPedus In the mid-1990s, the semiconductor industry embarked on a costly and problematic migration from 200mm to 300mm wafer fabs. At the time, the 300mm development efforts were in the hands of two groups—Sematech and a Japanese-led entity. The equipment industry was on the outside looking in. And as a result, the migration from 200mm to 300mm fabs was out of sync and a nightma... » read more

The Stakes Are High

By Joanne Itow - 20 Jun, 2013 - Comments: 0

By Joanne Itow Whether you call it a transition or a transformation, evolutionary or revolutionary, the implementation of 450mm wafers is going to be disruptive. There are both technical and operational hurdles associated with semiconductor production on 450mm wafers. The ramp of 450mm is expected to change the semiconductor manufacturing landscape. And what about the changes that may occur ev... » read more

Bigger Wafers, Bigger Risk

By Ed Sperling - 16 May, 2013 - Comments: 0

At 22/20/16/14nm the semiconductor industry is experiencing a rather new twist on Moore’s Law. Smaller, as in smaller feature sizes, is no longer assumed to be cheaper—or at least not for everyone. In fact, the cost per transistor for the first time in more than half a century could rise in some cases. Whether this outlook improves as the semiconductor industry gains more experience wit... » read more

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