Under The Radar At SPIE

By Mark LaPedus - 20 Mar, 2014 - Comments: 2

At the SPIE Advanced Lithography symposium, the best and brightest minds in the lithography, metrology, resist and design-for-manufacturing (DFM) fields assemble for a week. The annual event is a good way to get a pulse on the current state of lithography. At this year’s SPIE, it was simple to get a reading. Extreme ultraviolet (EUV) lithography remains delayed. The other next-generation l... » read more

Week In Review: Manufacturing, Design, Test

By Mark LaPedus - 14 Feb, 2014 - Comments: 0

Prosecutors have charged the CEO of chipmaker Entropic Communications with assaulting a model who appeared on the reality television show "Beverly Hills Nannies," according to the L.A. Times. Molecular Imprints Inc. (MII) has signed an agreement to sell its semiconductor imprint lithography equipment business to Canon. The agreement also allows for the creation of a new company that will ke... » read more

DSA, Multi-beam Make Steady Progress

By Mark LaPedus - 12 Dec, 2013 - Comments: 0

Semiconductor Engineering sat down to discuss current and future lithography challenges with Laurent Pain, lithography lab manager at CEA-Leti. What follows are excerpts of that conversation. SE: CEA-Leti has two major programs in lithography. One is in directed self-assembly (DSA) and the other is in multi-beam e-beam. Let’s start with multi-beam. What is Leti doing in multi-beam and what... » read more

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tag: Canon

Under The Radar At SPIE

Week In Review: Manufacturing, Design, Test

DSA, Multi-beam Make Steady Progress