CMOS 2.0: Layered Logic For The Post-Nanosheet Era


The semiconductor industry has relied on a simple equation for more than five decades — shrink the transistor, pack more onto every wafer, and watch performance soar as costs plummet. While each new node delivered predictable gains in speed, power efficiency, and density, that formula is rapidly running out of steam. As transistors approach single-digit nanometer processes, manufacturing c... » read more

Where Is Selective Deposition?


For years, the industry has been working on an advanced technology called area-selective deposition for chip production at 5nm and beyond. Area-selective deposition, an advanced self-aligned patterning technique, is still in R&D amid a slew of challenges with the technology. But the more advanced forms of technology are beginning to make some progress, possibly inching closer from the la... » read more

What’s After FinFETs?


Chipmakers are readying their next-generation technologies based on 10nm and/or 7nm finFETs, but it's still not clear how long the finFET will last, how long the 10nm and 7nm nodes for high-end devices will be extended, and what comes next. The industry faces a multitude of uncertainties and challenges at 5nm, 3nm and beyond. Even today, traditional chip scaling continues to slow as process ... » read more