tag: curvilinear mask patterning

Make The Impossible Possible: Use Variable-Shaped Beam Mask Writers And Curvilinear Full-Chip Inverse Lithography Technology For 193i Contacts/Vias With Mask-Wafer Co-Optimization
By eBeam Initiative - 22 Feb, 2024 - Comments: 0

Abstract: "Full-chip curvilinear inverse lithography technology (ILT) requires mask writers to write full reticle curvilinear mask patterns in a reasonable write time. We jointly study and present the benefits of a full-chip, curvilinear, stitchless ILT with mask-wafer co-optimization (MWCO) for variable-shaped beam (VSB) mask writers and validate its benefits on mask and wafer at Micron Tec... » read more

Curvilinear Mask Patterning For Maximizing Lithography Entitlement
By Synopsys - 15 Nov, 2023 - Comments: 0

Curvilinear Mask Patterning is a cutting-edge lithography technique that promises to maximize lithography entitlement by addressing complex design challenges and critical yield limiters. However, its widespread deployment has been limited by significant computational challenges. This paper includes practical solutions to overcome the computational challenges associated with this technique, as w... » read more

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