Survey: eBeam Initiative Luminaries (formerly Perceptions) Survey Results


Survey of 77 industry luminaries across 42 different companies in July 2020 says net neutral COVID-19 business impact by 2021, with 24% positive vs 20% negative predictions. Click here to view the survey results. » read more

2019-2020 Mask Maker Survey Results


The survey results of the 2019-2020 Mask Maker Survey from the eBeam Initiative. • Multi-Beam and EUV Trends Becoming Visible • 558,834 masks reported by 10 different companies than last year • Masks written with Multi-Beam Mask Writers more than doubled • EUV mask yield reported at 91% • MPC usage increasing at leading edge nodes Click here to see the presentation. » read more

Survey: 2019 eBeam Initiative Perceptions Survey Results


Results of the 2020 eBeam Initiative Perceptions survey, now called the Luminaries survey, will be made available starting on September 22 here: Meanwhile, here is the 8th Annual Perceptions Survey – 2019 (July). 68 luminaries across 42 different companies participated. Some highlights: Deep learning impact predicted by 2020: 76% of the respondents say it’s somewhat to very lik... » read more

Survey: 2019 eBeam Initiative Mask Makers’ Survey Results


In 2019, eBeam Initiative's Multi-beam Masks survey reported for the first time • 599,536 masks reported by 11 companies • 2789 were EUV masks • Average mask turnaround time (TAT) for =7nm was 11 days. Click here to see the survey results. » read more

EUV Annual Perceptions Survey – 2019


8th Annual Perceptions Survey – 2019 (July) of 68 luminaries across 42 different companies about use of EUV. Confidence in EUV remains high • 73% predict HVM by end of 2020 • Outlook is positive for actinic inspection and pellicle Click here to see survey slides. » read more

Fast Local Registration Measurements For Efficient E-beam Writer Qualification And Correction


By Klaus-Dieter Roeth, Hendrik Steigerwald, Runyuan Han, Oliver Ache, Frank Laske (KLA-Tencor MIE GmbH, Germany) Abstract Mask data are presented which demonstrate local registration errors that can be correlated to the writing swathes of state-of-the-art e-beam writers and multi-pass strategies, potentially leading to systematic device registration errors versus design of close to 2nm. Fur... » read more

2018 eBeam Initiative Perceptions Survey Results


EUV confidence and multi-beam remains high in the 7th Annual Perceptions Survey – 2018 (July). EUV perceptions remain positive. 82% of respondents predict EUV in HVM by end of 2021. Only 1% predict EUV will never happen. Confidence is high again for EUV lithography in high-volume manufacturing and expectations continue to grow around actinic mask inspection for EUV. Perceptions on the nee... » read more

The Week In Review: Manufacturing


Mask and fab equipment Seeking to speed up the semiconductor design and manufacturing process, D2S has rolled out its fifth-generation computational design platform (CDP). D2S, a supplier of GPU-accelerated computational systems or platforms, said the latest CDP is designed to enable faster simulations for a range of applications. Using Nvidia’s Pascal-based Tesla P40 GPUs, D2S’ fifth-... » read more

Multi-Patterning Issues At 7nm, 5nm


Continuing to rely on 193nm immersion lithography with multiple patterning is becoming much more difficult at 7nm and 5nm. With the help of various resolution enhancement techniques, optical lithography using a deep ultraviolet excimer laser has been the workhorse patterning technology in the fab since the early 1980s. It is so closely tied with the continuation of [getkc id="74" comment="Mo... » read more

Manufacturing Bits: April 26


Multi-beam inspection For some time, Singaporean startup Maglen has been developing a multi-beam e-beam inspection tool technology. Now, Maglen has reached two milestones. First, it has devised a full column test stand. The test stand includes a mechanical column and software. The second milestone is also significant. “We also dropped our beam and obtained our very first images,” sai... » read more

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