Deep learning efforts used in photomask to wafer semiconductor manufacturing, from ASML, Siemens EDA, and more.
The Survey: 2021 Deep Learning Applications List by eBeam Initiative members is a list of current deep learning efforts that are being used in photomask to wafer semiconductor manufacturing. Examples come from ASML, D2S, Fraunhofer IPMS, Hitachi High-Tech Corporation, imec, Siemens Industries Software, Inc., Siemens EDA, STMicroelectronics, and TASMIT.
Published by the eBeam Initiative Member Companies (February 2021)
Click here to see the survey.
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