SoC Electromagnetic Crosstalk: From A Tool Perspective

Most commercial electromagnetic (EM) solvers are limited by the size of the design that they can handle, or they may take a very large amount of time or memory to perform the task. These capacity, memory or runtime constraints often lead to dropping important details about the design and the surrounding environment, which in many cases can mask the effects of EM crosstalk, or can lead to the wr... » read more

Electromagnetic (EM) Crosstalk Analysis: Unlocking the Mystery

Ignoring electromagnetic crosstalk is highly risky and can cause significant time-to-market delays as well significant cost over runs. Most current SoC design flows fundamentally ignore inductance and EM effects, and the term “EM crosstalk analysis” may sound Greek to them. This short article provides a quick overview of the basic steps involved in doing EM crosstalk analysis as part of an ... » read more

Noise Issues At 10nm And Below

Most of the conversations below 10nm have been about lithography, materials and design constraints. But as companies push to 7nm and beyond, they are faced with a host of new challenges, including how to deal with electromagnetic crosstalk. Electromagnetic crosstalk is unwanted interference caused by the electric and magnetic fields of one or more signals (aggressors) affecting another sign... » read more

Working With FinFETs

One of the key technology trends driving semi-conductor industry is the adoption of finFET processes. As opposed to a traditional planar transistor, the finFET has an elevated channel or “fin,” which the gate wraps around. Due to their structure, finFETs generate much lower leakage power and allow greater device density. Compared to planar transistors, finFET operate at a lower voltage and ... » read more

FinFET Learning

FinFETs are not simple to work with. They’re difficult to manufacture, tricky to design, and they run the risk of greatly increased dynamic power density—particularly at 14/16nm, where extra margin is hard to justify—which affects everything from electromigration to signal integrity. Moreover, while finFETs have been on the drawing board for more than a decade, it’s taken four years ... » read more

Paving The Way To 16/14nm

The move to the next stop on the Moore’s Law road map isn’t getting any less expensive or easier, but it is becoming more predictable. Tools and programs are being expanded to address physical effects such as electrostatic discharge (ESD), electromigration and thermal effects from increased current density. Any or all of these three checklist items can affect the reliability of a chip. A... » read more

EM Analysis At Advanced Nodes

Going forward, a very different method of EM assessment can be proposed if we look at interconnect reliability from the position of its functionality, when the failure of the interconnect means its inability to function properly. The two most important functions of the chip interconnect are: Providing connectivity between different parts of design for proper signal propagations (signal circ... » read more

New Reliability Issues Emerge

By Ed Sperling Most consumers define reliability by whether a device turns on and works as planned, but the term is becoming harder to define as complexity increases and systems are interconnected. Adding more functionality in less space has made it more difficult to build complex chips, and it has made it more difficult to prevent problems in those chips. Verification coverage is a persist... » read more

New Reliability Issues

By Arvind Shanmugavel Reliability of ICs is a topic of growing concern with every technology node migration. With the onset of the 20nm process node from different foundries, reliability verification has taken center stage in design kits—and for good reason. Reliability margins have continued to decrease and have reached an inflection point at the 20nm node. The design and EDA communities ha... » read more

Power And Signal Line Electromigration Design And Reliability Validation Challenges

This white paper describes EM integrity analysis for power and signal lines. It outlines the various process and design trends that are increasing the likelihood of EM-induced failures in a design and looks at conventional verification techniques for EM integrity and contrasts those with what is required for advanced process nodes. To download this paper, click here. » read more

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