Survey: 2023 eBeam Initiative Luminaries Survey Results

By eBeam Initiative - 18 Oct, 2023 - Comments: 0

Luminaries are confident in high-NA EUV and curvilinear masks 12th Annual Luminaries Survey — July 2023 • Luminaries remain confident in broad High-NA EUV adoption by 2028 • Confidence doubled in leading-edge mask shops handling curvilinear mask demand • Curvilinear masks aren’t just for EUV • Luminaries are more confident about 2023 mask revenues than SEMI Click here to rea... » read more

Directed Self-Assembly Finds Its Footing

By Gregory Haley - 17 Aug, 2023 - Comments: 0

Ten years ago, when the industry was struggling to deliver EUV lithography, directed self-assembly (DSA) roared to the forefront of research and development for virtually every manufacturer determined to extend the limits of 193i. It was the hot topic at of the 2012 SPIE Advanced Lithography Conference, with one attendee from Applied Materials comparing its potential to disrupt the industry to ... » read more

Novel Assist Layers To Enhance EUV Lithography Performance Of Photoresists On Different Substrates

By Brewer Science - 16 Aug, 2023 - Comments: 0

In EUV lithography, good resist patterning requires an assist layer beneath it to provide adhesion to prevent pattern collapse of small features and allow for higher aspect ratios. In addition, future EUV high numerical aperture (NA) is expected to require a decrease in thickness from the overall patterning stack. In this study, we are exploring a fundamentally new approach to developing an alt... » read more

High-NA Lithography Starting To Take Shape

By Gregory Haley - 25 Jul, 2023 - Comments: 3

The future of semiconductor technology is often viewed through the lenses of photolithography equipment, which continues to offer better resolution for future process nodes despite an almost perpetual barrage of highly challenging technological issues. For years, lithography was viewed as the primary manufacturing-related gating factor to continued device scaling, beset by multiple delays th... » read more

Multi-Beam Writers Are Driving EUV Mask Development

By Jan Hendrik Peters - 25 Jul, 2023 - Comments: 1

By Jan Hendrik Peters (bmbg consult) and Ines Stolberg (Vistec Electron Beam) The European Mask and Lithography Conference (EMLC) 2023, held in Dresden this past June, was attended by about 180 people and over 60 talks and posters were presented. With several keynote and invited talks over two and a half days, the conference gave an overview of the semiconductor and technology landscape in E... » read more

The Next Chip Shortages?

By Ed Sperling - 15 Jun, 2023 - Comments: 0

The rollout of chiplets and heterogeneous designs could have unexpected implications on a global scale, creating a whole new round of chip shortages that will be much harder to fix. It's impossible to say for certain what will happen here in the wake of massive changes in chip design and a fluid and unpredictable geopolitical situation. The trade war between the United States and China began... » read more

193i Lithography Takes Center Stage…Again

By Gregory Haley - 15 Jun, 2023 - Comments: 0

Cutting-edge lithography to create smaller features increasingly is being supplemented by improvements in lithography for mature process nodes, both of which are required as SoCs and complex chips are decomposed and integrated into advanced packages. Until the 7nm era, the primary goal of leading-edge chipmakers was to pack everything onto a single system-on-chip (SoC) using the same process... » read more

Week In Review: Semiconductor Manufacturing, Test

By Gregory Haley - 02 Jun, 2023 - Comments: 0

Japanese and American trade officials announced a joint roadmap for cooperation in strengthening global semiconductor supply chains by advancing Japan-U.S. collaboration with emerging and developing countries in the Indo-Pacific. China and South Korea agreed to strengthen dialogue and cooperation on semiconductor industry supply chains with a focus on the supply of key raw materials and ensu... » read more

The History Of CMOS

By Paul McLellan - 25 May, 2023 - Comments: 0

Since CMOS has been around for about 50 years, a comprehensive history would be a book. This blog focuses on what I consider the major transitions. NMOS Before CMOS, there was NMOS (also PMOS, but I have no direct experience with that). An NMOS gate consisted of a network of N-transistors between the output and Vss, and a resistor (actually a transistor with an implant) between the output and... » read more

Assist Layers: The Unsung Heroes of EUV Lithography

By Katherine Derbyshire - 20 Apr, 2023 - Comments: 0

Most discussions of advanced lithography focus on three elements — the exposure system, photomasks, and photoresists — but that's only part of the challenge. Successfully transferring a pattern from the photomask to a physical structure on the wafer also depends on a variety of films working together, including the underlayers, the developers, and a variety of surface treatments. In fact... » read more

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tag: EUV

Survey: 2023 eBeam Initiative Luminaries Survey Results

Directed Self-Assembly Finds Its Footing

Novel Assist Layers To Enhance EUV Lithography Performance Of Photoresists On Different Substrates

High-NA Lithography Starting To Take Shape

Multi-Beam Writers Are Driving EUV Mask Development

The Next Chip Shortages?

193i Lithography Takes Center Stage…Again

Week In Review: Semiconductor Manufacturing, Test

The History Of CMOS

Assist Layers: The Unsung Heroes of EUV Lithography

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