The Growing Legacy Of Moore’s Law


By Ed Sperling Moore’s Law has defined semiconductor design since it was introduced in 1965, but increasingly it also has begun defining the manufacturing equipment, the cooling needed for end devices, and both the heat and performance of systems. In the equipment sector the big problem has been the delay in rolling out extreme ultraviolet (EUV). Moore’s Law will require tighter spacing... » read more

EUV Is Late—And It Hurts


Most chip architects and engineers couldn’t give a whit about the difference between deep ultraviolet and extreme ultraviolet lithography. It’s traditionally been a problem that foundries had to wrestle with, and that was their problem. Even DFM has been slow to catch on because what’s done in a foundry is of little interest up front.   The separation of those two worlds worked fine ... » read more

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