Crossing The Chasm: Uniting SoC And Package Verification


Wafer-level packaging enables higher form factor and improved performance compared to traditional SoC designs. However, to ensure an acceptable yield and performance, EDA companies, OSAT companies, and foundries must collaborate to establish consistent and unified automated WLP design and physical verification flows, while introducing minimum disruption to already-existing package design flows.... » read more

Changing The World, One Transaction At A Time


It’s the season for foundry seminars. A few weeks ago, eSilicon exhibited at the TSMC Open Innovation Platform event in San Jose. This week, we were at the GLOBALFOUNDRIES Technical Seminar, also in San Jose. I talked with a lot of folks during both events – recited the elevator pitch many times (“who is eSilicon?”). Everybody has attention deficit disorder on a tradeshow floor. Fast ex... » read more

The Week In Review: Design


Tools eSilicon uncorked a GDSII online quote system for TSMC, which allows chipmakers to pick a variety of information ranging from process technology to package to yield and tapeout and production forecast and get a quote within minutes. This is a new twist in the value chain provider market. Synopsys added program to speed up FPGA-based prototype creation, which includes approved third-pa... » read more

Semiconductor Self-Service: The Next Wave


The Internet is a marvelous invention. We all know it can bring a universe of human knowledge to our desktop. Thanks to some clever technology produced by some very successful companies, you also can browse all this information in real time, learning and discovering all the way. This ability to learn and discover is particularly interesting from a business perspective. It has created a truly... » read more

Deployment of OASIS In The Semiconductor Industry


The OASIS working group was first initiated in 2001, published the new format in March 2004, which was ratified as an official SEMI standard in September 2005. A follow-on initiative expanded the new standard to cover the needs of the mask manufacturing equipment sector with a derived standard called OASIS.MASK (P44) that was released in November 2005 and updated in May 2008. While there are ma... » read more

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