Ion Implantation Applications For In-Line SIMS Metrology


By Wei Ti Lee, Sarah Okada, Lawrence Rooney, Feng Zhang, and Benjamin Hickey In the semiconductor industry, ion implantation process has expanded to a wide range of applications with doses and energies spanning several orders of magnitude. Ion implantation is a very complicated process with many parameters and factors that affect the implant profile. For example, shadowing effects from high... » read more

Ion Implantation Applications For In-Line SIMS Metrology


In the semiconductor industry, ion implantation process has expanded to a wide range of applications with doses and energies spanning several orders of magnitude. Ion implantation is a very complicated process with many parameters and factors that affect the implant profile. For example, shadowing effects from higher aspect ratio of photoresist opening, ion channeling or de-channeling effect... » read more

More Robust Solid-State Lithium-Ion Batteries


New research paper titled "Xenon Ion Implantation Induced Surface Compressive Stress for Preventing Dendrite Penetration in Solid-State Electrolytes" from University of Surrey. Abstract "Solid-state electrolytes (SSEs) have been thrust into the limelight for the revival of energy-dense lithium metal batteries, but still face the challenge of failure caused by the dendrite penetration. Mou... » read more

Sub-Lithographic Patterning Via Tilted Ion Implantation For Scaling Beyond The 7nm Technology Node


Tilted ion implantation (TII) can be used in conjunction with pre-existing masking features on the surface of a substrate to form features with smaller dimensions and smaller pitch. In this paper, the resolution limit of this sub-lithographic patterning approach is examined via experiments as well as Monte Carlo process simulations. TII is shown to be capable of defining features with size belo... » read more