Research Bits: Mar. 3


Computational electron microscopy Researchers from Cornell University, TSMC, and ASM used electron ptychography for atomic-scale defect inspection of transistors. The computational imaging method uses an extremely precise electron microscope pixel array detector (EMPAD) to collect detailed scattering patterns of electrons after they pass through transistors and compare how the patterns chan... » read more

Chip Industry Technical Paper Roundup: Jan. 20


New technical papers recently added to Semiconductor Engineering’s library: [table id=515 /] Find more semiconductor research papers here. » read more

Ultralow-Loss PIC Platform From Violet to Near-Infrared, CMOS-Foundry Compatible (Caltech, UCSB et al.)


A new technical paper titled "Towards fibre-like loss for photonic integration from violet to near-infrared" was published by researchers at Caltech, UCSB, Leiden University and University of Southampton. Abstract excerpt: "Here we present an ultralow-loss PIC platform based on germano-silicate—the material underlying the extraordinary performance of optical fibre—but realized by a fu... » read more

Research Bits: July 12


Predicting crystal orientation Researchers from Nagoya University and RIKEN trained an AI on optical photographs of polycrystalline silicon and used it to predict crystal orientation during manufacturing. They found that the AI successfully predicted the grain orientation distribution. “The time required for this measurement was about 1.5 hours for taking optical photographs, training the... » read more