Can Mask Data Prep Tools Manage Data Glut?

By Ann Steffora Mutschler The trend to reduce critical dimension sizes has in turn increased design file sizes, especially with the addition of optical proximity correction (OPC) steps. This extra data translates to a bigger burden to be processed downstream in the flow on the way to the mask writer. At 28nm, design post-OPC data files sizes reach hundreds of gigabytes. With 20nm and below ... » read more

Mask Data Preparation Flow For Advanced Technology Nodes

The trend to reduce critical features dimension has dramatically increased design file size. Design tape–out flows at the 28 nm technology node handle post-OPC data files that reach hundreds of gigabytes. This trend increases at 20 nm and below. That predicts new challenges in mask data preparation flow for advanced technology nodes. We have developed a mask data preparation flow to tackle th... » read more