Viability of aZnMIm As A Resist For EUV Lithography (Johns Hopkins, Northwestern, Intel et al.)


A new technical paper (preprint) titled "Extreme Ultraviolet and Beyond Extreme Ultraviolet Lithography using Amorphous Zeolitic Imidazolate Resists Deposited by Atomic/Molecular Layer Deposition" was published by researchers at Johns Hopkins University, Northwestern University, Intel Corporation, Bruker Nano, EUV Tech and Lawrence Berkeley National Lab. The paper states "This study demonstr... » read more

Research Bits: May 7


High-temperature memory Researchers from the University of Pennsylvania and Air Force Research Laboratory demonstrated memory technology capable of enduring temperatures as high as 600° Celsius for more than 60 hours while retaining stability and reliability. The non-volatile memory device consists of a metal–insulator–metal structure, incorporating nickel and platinum electrodes with a 4... » read more

System Bits: Dec. 5


[caption id="attachment_429586" align="aligncenter" width="300"] Vivienne Sze, an associate professor of electrical engineering and computer science at MIT. Source: MIT[/caption] Building deep learning hardware A new course at MIT is bringing together both electrical engineering and computer science to educate student in the highly sought after field of deep learning. Vivienne Sze, an assoc... » read more