Mask Economics Shape High-NA EUV Adoption


Key Takeaways: Mask costs are not stopping leading-edge scaling, but they increasingly influence design, node, and process choices. High-NA EUV will tighten requirements for CD, EPE, local CDU, mask 3D modeling, stitching, and materials. Reduced depth of focus in High-NA EUV will drive new resist, etch, film, and absorber approaches. Experts at the table: Semiconductor Engin... » read more

Chip Industry Week In Review


Dealmaking Amkor inked a 10-year agreement with TSMC to provide advanced packaging and test services in Arizona, tying TSMC’s U.S. fab expansion to domestic OSAT capacity. Trump said in a post that Apple will partner with Intel on chip design and production in the U.S., marking a second reported win for the chipmaker this month. Intel Foundry will also reportedly manufacture 3 million... » read more

Chip Industry Week In Review


Computex in Taiwan: Arm and Nvidia introduced an AI PC platform, RTX Spark, with an Arm-based Grace CPU, Blackwell RTX GPU, and unified memory. Cadence announced a fully autonomous virtual agentic AI design engineer, enabling customers to run dynamic simulations in automated workflows. Intel launched Xeon 6+, its first data-center CPU built on Intel Foundry's 18A process. The company... » read more

Curvilinear Masks Push The Limits Of Inspection And Metrology


Key Takeaways: Curvilinear masks require native data flows across design, mask data prep, writing, inspection, and metrology. Inspection is shifting from finding all defects to identifying which mask variations actually print on wafer. High-NA EUV will intensify inspection challenges, particularly for small printable defects and actinic contrast limits. Experts at the table... » read more

Mask Technology Faces A New Set Of Challenges


Key Takeaways: Mask inspection and repair remain the critical bottleneck, even as multi-beam writers have reduced mask-writing constraints. Curvilinear masks are becoming viable for critical layers, but qualification, metrology, and inspection standards still lag production needs. Scaling curvilinear requires curvilinear-native data flows, model-based checks, GPU/HPC compute, and les... » read more

Chip Industry Week In Review


Manufacturing ASE and WUS are jointly building a ~$1.1B advanced packaging hub in Kaohsiung, Taiwan, for fan-out chip-on-substrate (FOCoS) and flip-chip ball grid array (FC BGA) technologies. The new site is expected to be completed by September 2029. SpaceX filed documents for a “Terafab” semiconductor manufacturing and computing facility at Gibbons Creek Reservoir in Texas, with a... » read more

A Detailed Evaluation of A Production Server With High-End MRDIMM Main Memory (BSC, Micron, Intel, UPC)


A new technical paper, "Performance and Energy Benefits of MRDIMMs," was published by researchers at Barcelona Supercomputing Center, Universitat Politecnica de Catalunya, Micron and Intel Corporation. Abstract "Multiplexed Rank DIMMs (MRDIMMs) have recently emerged as memory devices that enable higher bandwidth without increasing DRAM chip frequencies. This paper presents a detailed perf... » read more

Chip Industry Week in Review


Advanced nodes and capacity The US Commerce Dept. told IC equipment makers to stop shipments to Hua Hong Group, China's No. 2 chipmaker, in order to protect America's lead, according to Reuters. Global AI competition is causing wafer and packaging shortages, but capacity increases are expected to come online later this year and in 2027 to ease the crunch, according to TrendForce. Leadi... » read more

Chip Industry Week In Review


Disruptions caused by the Iran conflict have taken about one third of the global helium supply off the market, an essential gas for semiconductor manufacturing, reports the World Economic Forum. Other potential impacts for the chip industry include bromine and other chemical shortages, logistical disruptions, and higher energy prices incurred by fabs in Asia. Top Deals IBM and Lam R... » read more

Making Hybrid Bonding Better


Key Takeaways Fab processes are optimizing for cleanliness, planarity, and high bond quality. Nanotwinned copper and SiCN PVD enable lower anneal and deposition temperatures for HBM. A thin, protective layer helps preserve the Cu/dielectric during aggressive processes. The future of semiconductor manufacturing is no longer dependent just on shrinking features. Instead, chipm... » read more

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