tag: process variation

Rethinking Memory
By Ed Sperling - 16 Dec, 2015 - Comments: 3

Getting data in and out of memory is as important as the speed and efficiency of a processor, but for years design teams managed to skirt the issue because it was quicker, easier and less expensive to boost processor clock frequencies with a brute-force approach. That worked well enough prior to 90nm, and adding more cores at lower clock speeds filled the gap starting at 65nm. After that, th... » read more

Fab Issues At 7nm And 5nm
By Mark LaPedus - 23 Jul, 2015 - Comments: 2

The race toward the 7nm logic node officially kicked off in July, when IBM Research, GlobalFoundries and Samsung jointly rolled out what the companies claim are the industry’s first 7nm test chips with functional transistors. They're not alone, of course. Intel and TSMC also are racing separately to develop 7nm technology. And in the R&D labs, chipmakers also are working on technologies f... » read more

10nm Fab Challenges
By Mark LaPedus - 21 May, 2015 - Comments: 1

After a promising start in 2015, the semiconductor equipment industry is currently experiencing a slight lull. The pause is expected to be short-lived, however. Suppliers of [getkc id="208" comment="3D NAND"] devices are expected to add more fab capacity later this year. And about the same time, foundries are expected to order the first wave of high-volume production tools for 10nm. At 10nm... » read more

Predictive Fab Management
By Michael Watts - 18 Sep, 2014 - Comments: 0

Managing variation requires a different approach in fab management, moving from reactive to predictive methodologies. This is easier said than done, however. Predictive fab management requires a much more detailed understanding of everything happening in the fab, including process variation, equipment variation, mix variation—all of which must be managed with dispatch strategies to produc... » read more

Seeing Spots At 10nm
By Ed Sperling - 15 Jul, 2013 - Comments: 0

By Ed Sperling The relentless march to smaller process nodes means the defects are getting smaller, more numerous, and much harder to find. That explains why Applied Materials and KLA-Tencor both introduced new defect review and classification tools last week. The move to the 1x nm is on the top of both companies’ agendas, and with that comes defects on the walls of finFETs in addition to... » read more

Experts At The Table: Changes In The Ecosystem
By Ed Sperling - 15 Jul, 2013 - Comments: 0

By Ed Sperling Semiconductor Manufacturing & Design sat down with Michael Buehler-Garcia, director of design solutions marketing at Mentor Graphics; Seow Yin Lim, group director for marketing at Cadence; Kevin Kranen, director of strategic alliances at Synopsys, and Tom Quan, director at TSMC. What follows are excerpts of that conversation. SMD: Does the increasing collaboration in the ecos... » read more

The X Factor
By Ed Sperling - 30 May, 2013 - Comments: 0

By Ed Sperling The number of unknowns is growing in every segment of SoC design all the way through manufacturing, raising the stakes between reliability and the tradeoffs necessary to meet market windows. Tools are available to deal with some of these unknowns, or X’s, but certainly not all of them. Moreover, no single tool can handle all unknowns, some of which can build upon other unkn... » read more

Experts At The Table: FinFET Questions And Issues
By Ed Sperling - 19 Apr, 2013 - Comments: 0

By Ed Sperling Low-Power/High-Performance Engineering sat down to discuss the current state and future promise of finFETs, and the myriad challenges, with Ruggero Castagnetti, an LSI fellow; Barry Pangrle, senior power methodology engineer at Nvidia; Steve Carlson, group director of marketing at Cadence; and Mary Ann White, director of product marketing at Synopsys. What follows are excerpts o... » read more

Leveraging The Past
By Ed Sperling - 28 Jun, 2012 - Comments: 0

By Ann Steffora Mutschler It’s easy to forget that not every design today is targeted at 20nm, given the amount of focus put on the bleeding edge of technology. But in fact a large number of designs utilize the stability and reliability of older manufacturing nodes, as well as lower mask costs, by incorporating new design and verification techniques, with 2.5D designs being a prime example. ... » read more

Experts At The Table: Yield Issues
By Ed Sperling - 27 Mar, 2011 - Comments: 0

By Ed Sperling Semiconductor Manufacturing & Design sat down to discuss yield with Amiad Conley, technology marketing manager for yield and process control at Applied Materials; Cyrus Tabery, senior member of the GlobalFoundries technical staff for lithography development and DFM; Brady Benware, engineering manager for diagnosis and yield at Mentor Graphics, and Ankush Oberai, general man... » read more

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