中文 English

Innovative Dual Mark Design For Alignment Verification And Process Monitoring In Advanced Lithography


Improving on product overlay is one of the key challenges when shrinking technology nodes in semiconductor manufacturing. . . . With smart placement of alignment mark pairs in the X and Y direction, it is possible to determine intra-wafer distortion wafer-by-wafer. Both the measurement and modeled results are applied directly as a feed-forward correction to enable wafer level control. In this p... » read more

Week In Review: Auto, Security, Pervasive Computing


Pervasive computing — IoT, edge, cloud, data center, and back To simplify IoT workflows, Arm announced that it is putting parts of its Common Microcontroller Software Interface Standard (CMSIS) into an open project called Open-CMSIS-Pack. The CMSIS is a vendor-independent abstraction layer for MCUs, especially Arm Cortex-M processors, that makes it possible for developers to deal with softwa... » read more