CMP Process Characterization Using White Light Interferometry


Faster computer and electronic processors require smaller features for integrated circuits (IC), which in turn require smaller and smoother substrate surfaces. Chemical mechanical polishing (CMP) has become one of the most critical semiconductor fabrication technologies because it offers a superior means of removing unwanted topography in interlevel dielectric layers and achieving sufficient pl... » read more

Legacy Tools, New Tricks: Optical 3D Inspection


Stacking chips is making it far more difficult to find existing and latent defects, and to check for things like die shift, leftover particles from other processes, co-planarity of bumps, and adhesion of different materials such as dielectrics. There are several main problems: Not everything is visible from a single angle, particularly when vertical structures are used; Various struc... » read more

Advantages Of Measuring Surface Roughness With White Light Interferometry


The concept of measuring surface roughness originated nearly a century ago as a means to prevent uncertainty and disputes between manufacturers and buyers. Now, it has become a common identifier used throughout industry for validating manufacturing processes, confirming adherence to both internal and regulatory specifications, and guaranteeing quality and performance of end products. Subjective... » read more

Characterization Of CMP Processes With White Light Interferometry


Faster computer and electronic processors require smaller features for integrated circuits (IC), which in turn require smaller and smoother substrate surfaces. Chemical mechanical polishing (CMP) has become one of the most critical semiconductor fabrication technologies because it offers a superior means of removing unwanted topography in interlevel dielectric layers and achieving sufficient pl... » read more