Chip Industry Technical Paper Roundup: July 30


New technical papers recently added to Semiconductor Engineering’s library, including a best paper award winner at ISCA. [table id=246 /] More ReadingTechnical Paper Library home » read more

Key Technologies To Extend EUV To 14 Angstroms


The top three foundries plan to implement high-NA EUV lithography as early as 2025 for the 18 angstrom generation, but the replacement of single exposure high-NA (0.55) over double patterning with standard EUV (NA = 0.33) depends on whether it provides better results at a reasonable cost per wafer. So far, 2024 has been a banner year for high-numerical aperture EUV lithography. Intel Foundry... » read more

Co-optimizing HW Architecture, Memory Footprint, Device Placement And Per-Chip Operator Scheduling (Georgia Tech, Microsoft)


A technical paper titled “Integrated Hardware Architecture and Device Placement Search” was published by researchers at Georgia Institute of Technology and Microsoft Research. Abstract: "Distributed execution of deep learning training involves a dynamic interplay between hardware accelerator architecture and device placement strategy. This is the first work to explore the co-optimization ... » read more

CHERI RISC-V: HW Extension for Conditional Capabilities


A technical paper titled “Mon CHÈRI <3 Adapting Capability Hardware Enhanced RISC with Conditional Capabilities” was published by researchers at Ericsson Security Research, Université Libre de Bruxelles, and KU Leuven. Abstract: "Up to 10% of memory-safety vulnerabilities in languages like C and C++ stem from uninitialized variables. This work addresses the prevalence and lack of ade... » read more

Using Diffusion Models to Generate Chip Placements (UC Berkeley)


A technical paper titled “Chip Placement with Diffusion” was published by researchers at UC Berkeley. Abstract: "Macro placement is a vital step in digital circuit design that defines the physical location of large collections of components, known as macros, on a 2-dimensional chip. The physical layout obtained during placement determines key performance metrics of the chip, such as power... » read more

Formal Verification of Security Properties On RTL Designs


A technical paper titled “RTL Verification for Secure Speculation Using Contract Shadow Logic” was published by researchers at Princeton University, MIT CSAIL, and EPFL. Abstract: "Modern out-of-order processors face speculative execution attacks. Despite various proposed software and hardware mitigations to prevent such attacks, new attacks keep arising from unknown vulnerabilities. Thus... » read more

Ultrafast Charge Transfer Cascade In Semiconductor Materials


A technical paper titled “Ultrafast Charge Transfer Cascade in a Mixed-Dimensionality Nanoscale Trilayer” was published by researchers at the National Renewable Energy Laboratory. Abstract: "Innovation in optoelectronic semiconductor devices is driven by a fundamental understanding of how to move charges and/or excitons (electron-hole pairs) in specified directions for doing useful work, ... » read more

Battery Electronification: Intracell Actuation And Thermal Management (Penn State, EC Power)


A technical paper titled “Battery electronification: intracell actuation and thermal management” was published by researchers at Pennsylvania State University and EC Power. Abstract: "Electrochemical batteries – essential to vehicle electrification and renewable energy storage – have ever-present reaction interfaces that require compromise among power, energy, lifetime, and safety. He... » read more

Chip Industry Week In Review


The U.S. Department of Commerce and Amkor Technology signed a deal to provide up to $400 million in funding, under the CHIPS and Science Act, to build a previously announced end-to-end advanced packaging plant. The combined funding is expected to total about $2 billion. The new facility will add some 2,000 jobs in Peoria, Arizona. The SK hynix Board approved its Yongin Semiconductor Cluster... » read more

Capturing Knowledge Within LLMs


At DAC this year, there was a lot of talk about AI and the impact it is likely to have. While EDA companies have been using it for optimization and improving iteration loops within the flow, the end users have been concentrating on how to use it to improve the user interface between engineers and tools. The feedback is very positive. Large language models (LLMs) have been trained on a huge a... » read more

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