Manufacturing Bits: Oct. 17


WIMP dark matter detector The LUX-ZEPLIN (LZ) Group has taken another step towards finding an elusive part of the universe—dark matter. The LZ Group consists of 250 scientists and engineers from 37 institutions in the U.S., U.K., Portugal, Russia and Korea. In 2012, the group built the so-called Large Underground Xenon (LUX) dark matter detector. The detector is based on a 370 kilogram ... » read more

Manufacturing Bits: Oct. 10


5/2 fractional states Using a powerful magnet, Columbia University has observed a quantum particle in a bilayer graphene material, an event referred to as a 5/2 fractional quantum state. The observation could bring the industry closer to quantum computing. More specifically, researchers from Columbia said that they have observed “an anomaly in condensed matter physics—the even-denominat... » read more

Manufacturing Bits: Oct. 3


Making buckypaper The Masdar Institute of Science and Technology has developed a process that will transform carbon nanotube powder into so-called buckypaper. Buckypaper is a thin sheet made from carbon nanotubes. They are sometimes known as multi-walled carbon nanotube sheets. Meanwhile, carbon nanotubes are tube-shaped materials, which are 100,000 times smaller than the diameter of human ... » read more

Manufacturing Bits: Sept. 26


Electrical twisted yarn The U.S. Air Force Research Laboratory (AFRL), the University of Texas at Dallas and Hanyan University in South Korea have developed a twisted yarn technology that can be used to generate or harvest electrical energy. The technology, dubbed “twistron” yarn, incorporates twisted bundles of tiny coiled carbon nanotubes. The nanotube-based twistron yarn works in con... » read more

Manufacturing Bits: Sept. 19


Ion implant lithography At a recent conference, the University of California at Berkeley presented more details about its efforts to develop a multiple patterning method using tilted ion implantation (TII) technology. TII is somewhat similar today’s self-aligned double patterning (SADP) processes in logic and memory. SADP and the follow-on technology, self-aligned quadruple (SAQP), enable... » read more

Manufacturing Bits: Sept. 12


Failure analysis for 2.5D/3D chips Imec has developed a new failure analysis method to localize interconnection failures in 2.5D/3D stack die with through-silicon vias (TSVs). This technique is called LICA, which stands for light-induced capacitance alteration. It addresses the reliability issues for 2.5D/3D devices in a non-destructive and cost-effective manner at the wafer level. For s... » read more

Manufacturing Bits: Sept. 5


Laser-magnet metrology The FELIX Laboratory and the High Field Magnet Laboratory (HFML) have recently conducted the first measurements that combine a free electron laser (FEL) with a powerful magnet. The combination enables researchers to explore the electronic properties of materials. It provides a way to perform terahertz (THz) magneto spectroscopy on samples. The FELIX Laboratory at R... » read more

Manufacturing Bits: Aug. 29


Compact synchrotron EUV sources For some time, the industry has been exploring the development of next-generation power sources for extreme ultraviolet (EUV) lithography. ASML and Gigaphoton are separately developing EUV sources based on the more traditional and compact laser-produced-plasma (LPP) technology. Then, in R&D, others are exploring the development of futuristic EUV sources us... » read more

Manufacturing Bits: Aug. 22


Weighing protons The Max Planck Institute and Riken have conducted the world’s most precise measurement of the mass of a proton. Based on an experiment, researchers determined that the mass of a proton is 1.007276466583(15)(29) atomic mass units. This is three times more precise than the previous measurements from others. The numbers in parentheses refer to the statistical and systematic ... » read more

Manufacturing Bits: Aug. 15


Self-collapse lithography The University of California at Los Angeles (UCLA) has developed a technology called self-collapse lithography. The technology, reported in the journal Nano Letters, resembles the combination of nanoimprint, selective removal and a chemical lift-off process. More specifically, though, the technology provides insights into patterning using a chemical lift-off lith... » read more

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