A new technical paper titled “Unraveling the Reaction Mechanisms in a Chemically Amplified EUV Photoresist from a Combined Theoretical and Experimental Approach” was published by researchers at imec and KU Leuven.
“Our combined experimental and theoretical approach shows that EUV photoemission can simultaneously resolve chemical dynamics and the production of primary and secondary electrons, giving unique insights into the chemical transformation of photoresist materials. Our results pave the way for utilizing accessible, table-top EUV spectroscopy systems for observing EUV photoresist chemical dynamics, with the potential for time-resolved measurements of photoemission processes in the future,” states the paper.
Find the technical paper here. May 2025.
Galleni, Laura, Dhirendra P. Singh, Thierry Conard, Geoffrey Pourtois, Paul van der Heide, John Petersen, Kevin M. Dorney, and Michiel J. van Setten. “Unraveling the Reaction Mechanisms in a Chemically Amplified EUV Photoresist from a Combined Theoretical and Experimental Approach.” arXiv preprint arXiv:2505.07346 (2025).
Journal reference: Proc. SPIE 13428, Advances in Patterning Materials and Processes XLII, 134281D (22 April 2025)
Related DOI: https://doi.org/10.1117/12.3051002
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