Inside Lithography And Masks

By Mark LaPedus - 16 Mar, 2017 - Comments: 2

Semiconductor Engineering sat down to discuss lithography and photomask technologies with Gregory McIntyre, director of the Advanced Patterning Department at [getentity id="22217" e_name="Imec"]; Harry Levinson, senior fellow and senior director of technology research at [getentity id="22819" comment="GlobalFoundries"]; David Fried, chief technology officer at [getentity id="22210" e_name="Cove... » read more

China: Fab Boom or Bust?

By Mark LaPedus - 16 Mar, 2017 - Comments: 2

China’s semiconductor industry continues to expand at a frenetic pace. At present there are nearly two dozen new fab projects in China. Whether all these fab projects get off the ground is not entirely clear because the dynamics in China remain fluid. What is clear is the motivation behind this building frenzy—China is trying to reduce its huge trade imbalance in ICs. The country continu... » read more

Power Impacting Cost Of Chips

By Brian Bailey - 15 Mar, 2017 - Comments: 0

The increase in complexity of the power delivery network (PDN) is starting to outpace increases in functional complexity, adding to the already escalating costs of modern chips. With no signs of slowdown, designers have to ensure that overdesign and margining do not eat up all of the profit margin. The semiconductor industry is used to problems becoming harder at smaller geometries, but unti... » read more

10nm And 7nm Routability – How Is Your CAD Flow Doing?

By Tobias Bjerregaard - 09 Mar, 2017 - Comments: 0

At DesignCon in January, I was a panelist at a panel session entitled “Power Integrity For 10nm/7nm SoCs - Overcoming Physical Design Challenges And TAT.” I was on the panel together with Arvind Vel, Sr. Director Applications Engineering, ANSYS, Inc. and Ruggero Castagnetti, Distinguished Engineer, Broadcom Limited. This topic is of course extremely broad, but it was interesting getting fee... » read more

Worst-Case Results Causing Problems

By Ed Sperling - 09 Mar, 2017 - Comments: 0

The ability of design tools to identify worst-case scenarios has allowed many chipmakers to flag potential issues well ahead of tapeout, but as process geometries shrink that approach is beginning to create its own set of issues. This is particularly true at 16/14nm and below, where extra circuitry can slow performance, boost the amount of power required to drive signals over longer, thinne... » read more

What Next For OSATs

By Mark LaPedus - 06 Mar, 2017 - Comments: 0

Semiconductor Engineering sat down to discuss IC-packaging and business trends with Tien Wu, chief operating officer at Taiwan’s Advanced Semiconductor Engineering ([getentity id="22930" comment="ASE"]), the world’s largest outsourced semiconductor assembly and test (OSAT) vendor. What follows are excerpts of that conversation. SE: What’s the outlook for the IC industry in 2017? Wu:... » read more

Battling Fab Cycle Times

By Mark LaPedus - 16 Feb, 2017 - Comments: 9

The shift from planar devices to finFETs enables chipmakers to scale their processes and devices from 16nm/14nm and beyond, but the industry faces several challenges at each node. Cost and technical issues are the obvious challenges. In addition, cycle time—a key but less publicized part of the chip-scaling equation—also is increasing at every turn, creating more angst for chipmakers and... » read more

Fix Processes, Then Silos

By Ed Sperling - 09 Feb, 2017 - Comments: 0

Jack Welch, former CEO of GE, was a big proponent of what he called a "boundaryless corporation." It was a good sound bite, but it pales in comparison to former Intel CEO Andy Grove's philosophy of working out of a cubicle, just like the rest of his staff. While it's great to have corporate buy-in for breaking down silos, which are vertically integrated, the real problem for semiconductor c... » read more

Confidence In 7nm Designs Requires Multi-Variable, Multi-Scenario Analysis

By Sankar Ramachandran - 09 Feb, 2017 - Comments: 0

As designs move toward 7-nanometer (nm) process nodes, engineering and production cost dramatically increases and the stake in getting the design right the first time becomes significantly higher than ever before. You are faced with the question, “how confident are you in your design analysis coverage?” Tighter noise margin, increasing power density, faster switching current and greater ... » read more

Routing Signals At 7nm

By Ed Sperling - 09 Feb, 2017 - Comments: 0

[getperson id="11763" comment="Tobias Bjerregaard"], [getentity id="22908" e_name="Teklatech's"] CEO, discusses the challenges of designs at 7nm and beyond, including power integrity, how to reduce IR drop and timing issues, and how to improve the economics of scaling. SE: How much further can device scaling go? Bjerregaard: The way you should look at this is [getkc id="74" comment="Moore... » read more

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tag: 7nm

Inside Lithography And Masks

China: Fab Boom or Bust?

Power Impacting Cost Of Chips

10nm And 7nm Routability – How Is Your CAD Flow Doing?

Worst-Case Results Causing Problems

What Next For OSATs

Battling Fab Cycle Times

Fix Processes, Then Silos

Confidence In 7nm Designs Requires Multi-Variable, Multi-Scenario Analysis

Routing Signals At 7nm

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