tag: Applied Materials

What’s After Silicon?
By Katherine Derbyshire - 09 Jan, 2014 - Comments: 4

As discussed in the first article in this series, germanium is one of the leading candidates to succeed silicon as the channel material for advanced transistors, and has been for several years. The fundamental challenges of germanium integration were detailed at length in 2007. Unfortunately, knowing what the issues are does not necessarily lead to a solution. When a MOSFET transistor turns ... » read more

The Week In Review: Manufacturing And Design
By Mark LaPedus - 03 Jan, 2014 - Comments: 0

Blocking cell phone use and texting while driving have been proposed by the U.S. government and for good reason. About 10 people a day are killed in “distraction-affected” car accidents in the U.S., according to the U.S. National Highway Traffic Safety Administration. As a result, some companies are developing technologies that can block texts while driving. But according to Strategy Analyt... » read more

Experts At The Table: MEMS Challenges
By Mark LaPedus - 30 Dec, 2013 - Comments: 0

Semiconductor Engineering sat down to discuss the challenges of MEMS with Rakesh Kumar, senior director of the MEMS program at GlobalFoundries; Tak Tanaka, managing director for Applied Global Services at Applied Materials; Paul Lindner, executive technology director at EV Group; and Alissa M. Fitzgerald, founder and managing member at A.M. Fitzgerald & Associates. What follows are excerpts... » read more

Experts At The Table: MEMS Challenges
By Mark LaPedus - 20 Dec, 2013 - Comments: 0

Semiconductor Engineering sat down to discuss the challenges of MEMS with Rakesh Kumar, senior director of the MEMS program at GlobalFoundries; Tak Tanaka, managing director for Applied Global Services at Applied Materials; Paul Lindner, executive technology director at EV Group; and Alissa M. Fitzgerald, founder and managing member at A.M. Fitzgerald & Associates. What follows are excerpts... » read more

Week In Review: Manufacturing And Design
By Mark LaPedus - 20 Dec, 2013 - Comments: 0

Wearable computing is one of the hottest topics being discussed today. Angela McIntyre, research director at Gartner, said digital health and fitness will be among the hottest segments in the arena. Don't look now, but ASML Holding has delayed its 450mm tool programs. "As for 450, ASML has paused the development of 450mm lithography systems, both EUV and 193, until customer demand and the ti... » read more

The Week In Review: Manufacturing & Design
By Mark LaPedus - 13 Dec, 2013 - Comments: 0

Tensions between the U.S. and China are growing. In a research report, Gus Richard, an analyst at Piper Jaffray, said: “The technology sector is being impacted by U.S./Chinese tensions over cybersecurity. The combination of Huawei being blocked from doing business in the United States and the Snowden affair are impacting U.S. tech companies' prospects in China. China’s state-run media ident... » read more

Experts At The Table: MEMS Challenges
By Mark LaPedus - 13 Dec, 2013 - Comments: 1

Semiconductor Engineering sat down to discuss the challenges of MEMS with Rakesh Kumar, senior director of the MEMS program at GlobalFoundries; Tak Tanaka, managing director for Applied Global Services at Applied Materials; Paul Lindner, executive technology director at EV Group; and Alissa M. Fitzgerald, founder and managing member at A.M. Fitzgerald & Associates. SE: What’s happening... » read more

Can Intel Dethrone The Foundry Giants?
By Mark LaPedus - 12 Dec, 2013 - Comments: 3

The leading-edge foundry business isn’t for the faint of heart. It requires deep pockets and sound technology to keep pace in the chip-scaling race. And despite pouring billions of dollars into new fabs and processes, foundries are competing for fewer customers at each node. Given the difficult business conditions, only a handful of vendors can afford to compete in the high-end foundry bus... » read more

DSA, Multi-beam Make Steady Progress
By Mark LaPedus - 12 Dec, 2013 - Comments: 0

Semiconductor Engineering sat down to discuss current and future lithography challenges with Laurent Pain, lithography lab manager at CEA-Leti. What follows are excerpts of that conversation. SE: CEA-Leti has two major programs in lithography. One is in directed self-assembly (DSA) and the other is in multi-beam e-beam. Let’s start with multi-beam. What is Leti doing in multi-beam and what... » read more

Challenges Mount In Inspection And Metrology
By Mark LaPedus - 12 Dec, 2013 - Comments: 0

Chipmakers are moving full speed ahead toward smaller process nodes, thereby driving up the costs and complexities in chip manufacturing. The migrations also are putting enormous stress on nearly all points of the fab flow, including a critical but unsung part of the business—process control. Process control involves 20 or so different segments in the inspection and metrology arena. Genera... » read more

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