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Manufacturing Bits: June 29


Speeding up ALD with AI The U.S. Department of Energy’s (DOE) Argonne National Laboratory has developed various ways to make atomic layer deposition (ALD) more efficient by using artificial intelligence (AI). ALD is a deposition technique that deposits materials one layer at a time on chips. For years, ALD has been used for the production of DRAMs, logic devices and other products. In ... » read more

Power/Performance Bits: June 15


Low-loss photonic IC Researchers at EPFL built a photonic integrated circuit with ultra-low loss. The team focused on silicon nitride (Si3N4), which has orders of magnitude lower optical loss compared to silicon. It is used in low-loss applications such as narrow-linewidth lasers, photonic delay lines, and nonlinear photonics. In applying the material to photonic ICs, they took advantage... » read more

Power/Performance Bits: Feb. 2


MXene antennas Researchers at Drexel University and Villanova University developed spray-on antennas made of the 2D materials MXene that is flexible and light while maintaining good signal. "This combination of communications performance with extreme thinness, flexibility and durability sets a new standard for antenna technology," said Yury Gogotsi, professor of Materials Science and Engine... » read more

Manufacturing Bits: Jan. 19


X-ray imaging with AI The U.S. Department of Energy’s Argonne National Laboratory has demonstrated the use of artificial intelligence (AI) to accelerate the process of reconstructing images from coherent X-ray scattering data. Argonne’s technology, called PtychoNN, combines an X-ray imaging technique called ptychography with a neural network. This in turn enables researchers to decode X... » read more

The Battery Problem


The fires sweeping the West Coast of the United States point to the need for a whole different way of managing power on both a macro and a micro level. Since the millennium, the power demand from data centers and from mobile devices has been climbing steadily. There are roughly 7.8 billion people on the planet, up from 6.115 billion people in 2000, according to the World Bank. Many of them o... » read more

Manufacturing Bits: Aug. 18


Quantum Internet The U.S. Department of Energy (DOE) recently unveiled a strategy to develop a quantum Internet in the United States. DOE’s 17 National Laboratories will serve as the backbone of the quantum Internet, which will rely on the laws of quantum mechanics to control and transmit information over a network. Currently in its initial stages of development, the quantum Internet coul... » read more

Power/Performance Bits: July 21


AI hardware Researchers at Purdue University, University of California San Diego, Argonne National Laboratory, University of Louisville, Brookhaven National Laboratory, and University of Iowa developed hardware that can learn skills, offloading some of the energy needed by AI software. "Software is taking on most of the challenges in AI. If you could incorporate intelligence into the circui... » read more

Making Chips At 3nm And Beyond


Select foundries are beginning to ramp up their new 5nm processes with 3nm in R&D. The big question is what comes after that. Work is well underway for the 2nm node and beyond, but there are numerous challenges as well as some uncertainty on the horizon. There already are signs that the foundries have pushed out their 3nm production schedules by a few months due to various technical issu... » read more

Manufacturing Bits: March 24


Autonomous microscopes FLEET, also known as the ARC Centre of Excellence in Future Low-Energy Electronics Technologies, has developed an autonomous scanning probe microscopy (SPM) technology. SPM is an instrument that makes use of an atomically sharp probe. The probe is placed in close proximity above the surface of a sample. With the probe, the SPM forms images of the surface of the sample... » read more

Manufacturing Bits: Feb. 18


Molecular layer etch The U.S. Department of Energy’s Argonne National Laboratory has made new advances in the field of molecular layer etching or etch (MLE). MLE is related to atomic layer etch (ALE). Used in the semiconductor industry, ALE selectively removes targeted materials at the atomic scale without damaging other parts of the structure. ALE is related to atomic layer deposition... » read more

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