Why It’s So Hard To Create New Processors


The introduction, and initial success, of the RISC-V processor ISA has reignited interest in the design of custom processors, but the industry is now grappling with how to verify them. The expertise and tools that were once in the market have been consolidated into the hands of the few companies that have been shipping processor chips or IP cores over the past 20 years. Verification of a pro... » read more

Software-Defined Hardware Gains Ground — Again


The traditional approach of running generic software on x86-based CPUs is running out of steam for many applications due to the slowdown of Moore’s Law and the concurrent exponential growth in software application complexity and scale. In this environment, the software and hardware are disparate due the dominance of the x86 architecture. “The need for and advent of the hardware accelerat... » read more

Machine Learning At The Edge


Moving machine learning to the edge has critical requirements on power and performance. Using off-the-shelf solutions is not practical. CPUs are too slow, GPUs/TPUs are expensive and consume too much power, and even generic machine learning accelerators can be overbuilt and are not optimal for power. In this paper, learn about creating new power/memory efficient hardware architectures to meet n... » read more

High-Performance Memory For AI And HPC


Frank Ferro, senior director of product management at Rambus, examines the current performance bottlenecks in high-performance computing, drilling down into power and performance for different memory options, and explains what are the best solutions for different applications and why. » read more

The Challenges Of Building Inferencing Chips


Putting a trained algorithm to work in the field is creating a frenzy of activity across the chip world, spurring designs that range from purpose-built specialty processors and accelerators to more generalized extensions of existing and silicon-proven technologies. What's clear so far is that no single chip architecture has been deemed the go-to solution for inferencing. Machine learning is ... » read more

The Cost Of Programmability


Nothing comes for free, and that is certainly true for the programmable elements in an SoC. But without them we are left with very specific devices that can only be used for one fixed application and cannot be updated. Few complex devices are created that do not have many layers of programmability, but the sizing of those capabilities is becoming more important than in the past. There are... » read more

Understanding SLAM (Simultaneous Localization And Mapping)


Amol Borkar, senior product manager for AI and computer vision at Cadence, talks with Semiconductor Engineering about mapping and tracking the movement of an object in a scene, how to identify key corners in a frame, how probabilities of accuracy fit into the picture, how noise can affect that, and how to improve the performance and reduce power in these systems. » read more

Divided On System Partitioning


Building an optimal implementation of a system using a functional description has been an industry goal for a long time, but it has proven to be much more difficult than it sounds. The general idea is to take software designed to run on a processor and to improve performance using various types of alternative hardware. That performance can be specified in various ways and for specific applic... » read more

A New Dawn For IP


The IP industry is changing again. The concept started as build once, use everywhere, but today it is more like architect once, customize everywhere. Few designs can afford sub-optimal IP for their application. The need for customized IP is driven by both leading-edge designs and the trailing markets, although for different reasons. While this customization is causing IP companies to transfo... » read more

Multi-Patterning EUV Vs. High-NA EUV


Foundries are finally in production with EUV lithography at 7nm, but chip customers must now decide whether to implement their next designs using EUV-based multiple patterning at 5nm/3nm or wait for a new single-patterning EUV system at 3nm and beyond. This scenario revolves around ASML’s current extreme ultraviolet (EUV) lithography tool (NXE:3400C) versus a completely new EUV system with... » read more

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