Is Cloud Computing Suitable for Chip Design?

By Brian Bailey - 27 Sep, 2018 - Comments: 2

Is semiconductor design being left behind in a cloud-dominated world? Finance, CRM, office applications and many other sectors have made the switch to a cloud-based computing environment, but the EDA industry and its users have hardly started the migration. Are EDA needs and concerns that different from everyone else? We are starting to see announcements from EDA companies, but few cheerleaders... » read more

China’s Electric Car Ambitions

By Mark LaPedus - 20 Sep, 2018 - Comments: 1

China, the world’s largest car market, is also leading the charge in the electric vehicle business. But with little or no fanfare, China also wants to dominate the critical ecosystem for battery-electric vehicles and hybrids. In fact, the nation is already the world’s largest producer of batteries for electric vehicles. And it also controls a sizable part of the supply chain, such as the... » read more

Physical Verification For Silicon Photonics: Don’t Panic!

By Omar El-Sewefy - 06 Sep, 2018 - Comments: 0

Silicon photonics augments traditional electrical signals in integrated circuits (ICs) with light transmission to speed up data transfer and reduce power consumption. According to MarketsandMarkets, the overall silicon photonics market is worth approximately $774.1M in 2018, and is expected to reach $1,988.2M by 2023, at a CAGR of 20.8% between 2018 and 2023 [1]. Cloud computing is one market... » read more

Week In Review: Design, Low Power

By Jesse Allen - 20 Jul, 2018 - Comments: 0

Aldec expanded the rule-checking capabilities of its ALINT-PRO tool, adding twice as many FSM checks and new graphical representations to aid state exploration. Also included is enhanced setup automation for complex Xilinx Vivado and ISE projects that automatically organizes a workspace to deliver hierarchical and incremental DRC and CDC analysis. Xilinx acquired AI startup DeePhi Technology... » read more

5nm Design Progress

By Ann Mutschler - 17 Jul, 2018 - Comments: 1

Activity surrounding the 5nm manufacturing process node is quickly ramping, creating a better picture of the myriad and increasingly complex design issues that must be overcome. Progress at each new node after 28nm has required an increasingly tight partnership between the foundries, which are developing new processes and rule decks, along with EDA and IP vendors, which are adding tools, met... » read more

Optimizing Your DRC Debug Can Reap Big Productivity Gains

By Srinivas Velivala - 10 May, 2018 - Comments: 0

Debugging design violations found by design rule checking (DRC) has always taken a significant share of the time needed to get a design to tapeout. And debug time only increases as the number and complexity of DRC expands with each new process node. Any steps you can take to make your DRC debug process more efficient directly improves your productivity. One technique for minimizing debug tim... » read more

Advanced 3D Design Technology Co-Optimization For Manufacturability

By Yu De Chen - 30 Apr, 2018 - Comments: 0

By Yu De Chen, Jacky Huang, Dalong Zhao, Jiangjiang (Jimmy) Gu, and Joseph Ervin Yield and cost have always been critical factors for both manufacturers and designers of semiconductor products. It is a continuous challenge to meet targets of both yield and cost, due to new device structures and the increasing complexity of process innovations introduced to achieve improved product performanc... » read more

Interface DRC Can Streamline Chip-Level Interface Physical Verification

By James Paris - 26 Apr, 2018 - Comments: 0

In most design companies, the chip-level physical implementation teams responsible for design floorplanning in place and route (P&R) environments also manage top-level physical verification from the early floorplanning stages through tapeout. In early floorplanning stages, blocks placed in the chip-level floorplan are usually still under development. Merging these incomplete blocks with the... » read more

EUV’s New Problem Areas

By Mark LaPedus - 19 Mar, 2018 - Comments: 2

Extreme ultraviolet (EUV) lithography is moving closer to production, but problematic variations—also known as stochastic effects—are resurfacing and creating more challenges for the long-overdue technology. GlobalFoundries, Intel, Samsung and TSMC hope to insert [gettech id="31045" comment="EUV"] lithography into production at 7nm and/or 5nm. But as before, EUV consists of several compo... » read more

A Reliability Baseline Is Essential For Today’s Complex IC Designs

By Matthew Hogan - 22 Feb, 2018 - Comments: 0

Design rule checking (DRC) represents a common platform by which we can all compare relative rule complexity. The industry expectation is that all foundries will provide complete DRC and layout vs. schematic (LVS) rule decks at all process nodes for the successful tape-out of IC designs. However, not only are DRC operations growing significantly (Figure 1), but the scope of the rules needed to ... » read more

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Knowledge Centers
Entities, people and technologies explored

Shift Left Is The Tip Of The Iceberg

A transformative change is underway for semiconductor design and EDA. New languages, models, and abstractions will need to be created.

by Brian Bailey

Partitioning In The Chiplet Era

Understanding how chiplets interact under different workloads is critical to ensuring signal integrity and optimal performance in heterogeneous designs.

by Ann Mutschler

3.5D: The Great Compromise

Pros and cons of a middle-ground chiplet assembly that combines 2.5D and 3D-IC.

by Ed Sperling

AI’s Role In Chip Design Widens, Drawing In New Startups

Focus is on letting engineers do much more with the same or fewer resources — and less drudgery.

by Karen Heyman

Key Technologies To Extend EUV To 14 Angstroms

Alongside high-NA EUV will be better-performing photoresists, reduced roughness using passivation and etch, and lateral etching to reduce tip-to-tip dimensions.

by Laura Peters

What Comes After HBM For Chiplets

The standard for high-bandwidth memory limits design freedom at many levels, but that is required for interoperability. What freedoms can be taken from other functions to make chiplets possible?

by Brian Bailey

Memory Fundamentals For Engineers

eBook: Nearly everything you need to know about memory, including detailed explanations of the different types of memory; how and where these are used today; what's changing, which memories are successful and which ones might be in the future; and the limitations of each memory type.

by The SE Staff

Why Small Fab And Assembly Houses Are Thriving

Megafabs churning out the most advanced processors are not the only game in town.

by Bryon Moyer

tag: DRC