tag: DRC

Déjà Vu For CMP Modeling?
By Jeff Wilson - 17 Sep, 2015 - Comments: 0

One definition of design for manufacturing (DFM) is providing knowledge about the impact of the manufacturing process on a design layout to the designers, so they can use that information to improve the robustness, reliability, or yield of their design before tapeout. Essentially, DFM is about designers taking ownership of the full “lifecycle” of a design, and going beyond the required desi... » read more

Ensuring Optimal Performance For Physical Verification
By Mentor, a Siemens Business - 22 Jul, 2015 - Comments: 0

By accessing the most recently qualified version of foundry rule files, users get the most efficient rule implementations. By adopting the most recent version of Calibre, users get the latest improvements in available operations, operation performance, data hierarchy optimization and total scaling, providing the best possible performance and minimizing runtimes. Design teams running full-chip D... » read more

Case Studies In Double-Patterning Debug
By David Abercrombie - 18 Jun, 2015 - Comments: 0

Double patterning (DP) impacts just about every part of the design and manufacturing flows. However, the kinds of issues you encounter, the way they manifest themselves, and the ideal way to address them may be very different in different parts of these flows. I feel like I have spent a lot of time the last six months or so working with place and route (P&R) and chip finishing engineers on DP i... » read more

Balancing On The Color Density Tightrope
By David Abercrombie - 19 Feb, 2015 - Comments: 0

Balancing on wobbly tightropes is something that chip designers get pretty good at. For instance, there is a fine balance between optimizing performance and minimizing leakage in a design layout. Dealing with the new requirements that multi-patterning (MP) introduces into a design flow creates many new tightropes to walk. I tiptoed out on one of the rarely talked about ones in my last article�... » read more

Rule Deck Comparison Doesn’t Have To Be Difficult
By Saunder Peng - 22 Jan, 2015 - Comments: 0

Foundry rule decks change all the time, as foundries uncover new manufacturing issues, or the process changes, or design criteria are tightened to improve runtime or stability. Sometimes new versions of a user’s design rule checking (DRC) tool are released, and the results from the DRC run differ from the previous version. Or perhaps a company wants to compare results between rule decks from ... » read more

Conflicting Needs For IoT Edge Designs
By Ed Sperling - 20 Nov, 2014 - Comments: 1

The mad rush has begun to hype the [getkc id="76" comment="Internet of Things"], but the path forward isn't quite as straightforward as the marketers would like it to be. ICs used at the edge of the IoT—the ones that gather information to be controlled by smart phones or tablets and transmitted to devices for processing and data analytics—need to be designed differently than the initial for... » read more

Design Rules Explode At New Nodes
By Ed Sperling - 17 Nov, 2014 - Comments: 0

Semiconductor Engineering sat down changing design rules with Sergey Shumarayev, senior director of custom IP design at Altera; Luigi Capodieci, R&D fellow at [getentity id="22819" comment="GlobalFoundries"]; Michael White, director of product marketing for Calibre Physical Verification at [getentity id="22017" e_name="Mentor Graphics"], and Coby Zelnik, CEO of [getentity id="22478" e_name=... » read more

Design Rules Explode At New Nodes
By Ed Sperling - 16 Oct, 2014 - Comments: 0

Semiconductor Engineering sat down changing design rules with Sergey Shumarayev, senior director of custom IP design at Altera; Luigi Capodieci, R&D fellow at [getentity id="22819" comment="GlobalFoundries"]; Michael White, director of product marketing for Calibre Physical Verification at [getentity id="22017" e_name="Mentor Graphics"], and Coby Zelnik, CEO of [getentity id="22478" e_name=... » read more

The Route To Faster Physical Verification And Better Designs
By Jean-Marie Brunet - 18 Sep, 2014 - Comments: 0

By Nancy Nguyen & Jean-Marie Brunet As we’ve moved to today’s leading-edge nodes, physical layout designers have faced more and more challenges to get their design to tape-out on schedule. Timing becomes increasingly difficult to converge, power reduction for both IR and leakage becomes a big issue, and most importantly, how do we meet all of the ever-growing and more complex signoff d... » read more

Signoff Intensity On The Rise
By The SE Staff - 15 Aug, 2014 - Comments: 2

By Ann Steffora Mutschler and Ed Sperling Lithography and signoff are crossing swords at 16/14nm and 10nm, creating new problems that raise questions about just how confident design teams will be when they sign off before tapeout — and how many respins are likely to follow. While designs at 20nm, 16nm and 14nm typically rely on colorless double patterning, at 10nm colors are mandatory. ... » read more

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