tag: imec

Reliability After Planar Silicon
By Katherine Derbyshire - 29 Jul, 2015 - Comments: 2

Negative bias temperature instability (NBTI) poses a very serious reliability challenge for highly scaled planar silicon transistors, as previously discussed. However, the conventional planar silicon transistor appears to be nearing the end of its life for other reasons, too. The mobility of carriers in silicon limits switching speed even as it becomes more difficult to maintain sufficient elec... » read more

Fab Issues At 7nm And 5nm
By Mark LaPedus - 23 Jul, 2015 - Comments: 2

The race toward the 7nm logic node officially kicked off in July, when IBM Research, GlobalFoundries and Samsung jointly rolled out what the companies claim are the industry’s first 7nm test chips with functional transistors. They're not alone, of course. Intel and TSMC also are racing separately to develop 7nm technology. And in the R&D labs, chipmakers also are working on technologies f... » read more

What Will 7nm And 5nm Look Like?
By Mark LaPedus - 23 Jul, 2015 - Comments: 0

Citing an assortment of undisclosed manufacturing issues, Intel in July pushed out the introduction of its 10nm chip and process technology to the second half of 2017. This is roughly six or more months later than expected. With the delay at 10nm, [getentity id="22846" e_name="Intel"] also pushed out its process cadence from 2 to 2.5 years. Other foundries, meanwhile, are struggling to keep ... » read more

Dealing With Atoms
By Mark LaPedus - 13 Jul, 2015 - Comments: 0

Chipmakers are ramping up a new range of device architectures, such as 3D NAND and finFETs. But to enable current and future devices, IC vendors will require new breakthroughs, including tools that can process tiny structures and films, even at the atomic level. The problem? There are gaps in terms of techniques that can process chips at the atomic level. Looking to help fill part of the ... » read more

Manufacturing Bits: July 7
By Mark LaPedus - 07 Jul, 2015 - Comments: 0

Silicon photonics prototyping A group of European and other research organizations have put the finishing touches on a project to help propel the development of silicon photonics into the commercial market. The project, dubbed ESSenTIAL, enables small- to mid-sized enterprises to develop prototypes and products based on silicon photonics. Funded by the European Commission, the project inclu... » read more

The Week In Review: Manufacturing
By Mark LaPedus - 02 Jul, 2015 - Comments: 0

GlobalFoundries completed its acquisition of IBM’s Microelectronics Group, creating a behemoth that is expected to extend well beyond the combined footprint of the existing companies. As part of the deal, GlobalFoundries will get two additional fabs, one of which makes RF SOI chips. But while IBM was hesitant to expand that business by adding new fab capacity, GlobalFoundries already has t... » read more

Manufacturing Bits: June 30
By Mark LaPedus - 30 Jun, 2015 - Comments: 0

3D printed supercars Divergent Microfactories has rolled out a new approach to auto manufacturing based on 3D printing. The technology is based on what the company calls a Node. A Node is a metal alloy that is produced using 3D printers. The Nodes are combined with carbon fiber tubes, which, in turn, enable the development of a car chassis. [caption id="attachment_20782" align="alignleft... » read more

The Week In Review: Manufacturing
By Mark LaPedus - 26 Jun, 2015 - Comments: 0

Semiconductor Manufacturing International Corp. (SMIC), Huawei, Imec and Qualcomm have announced the formation of the SMIC Advanced Technology Research & Development (Shanghai) Corp., an equity joint venture company. Located in China, the joint venture company will focus on R&D towards next-generation CMOS logic technology. The current focus will be on developing 14nm logic technology, ... » read more

Litho Challenges Break The Design-Process Wall
By Katherine Derbyshire - 22 Jun, 2015 - Comments: 3

The days when chip designers could throw tape “over the wall” to the manufacturing side are long gone. Over the last several technology generations, increasingly restrictive process kits have forced designers to accommodate their circuit structures to the manufacturing process. Lacking a successor to 193nm lithography, the industry has turned to increasingly complex resolution enhancemen... » read more

Manufacturing Bits: June 16
By Mark LaPedus - 16 Jun, 2015 - Comments: 0

Harmonic EUV The U.S. Department of Energy’s Lawrence Berkeley National Laboratory has devised an efficient extreme ultraviolet (EUV) source. The technology could one day be used for a new class of metrology tools, based on angle-resolved photoemission spectroscopy (ARPES). This technique makes use of a photoelectric effect for studying materials. To enable the source, Berkeley Labs devel... » read more

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