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Manufacturing Bits: Dec. 8


Progress report on EUV resists The development of resists is a key part of extreme ultraviolet (EUV) lithography. “EUV resists are production ready,” said Kevin Cummings, Sematech’s director of lithography. “However, through Sematech’s work with the resist suppliers, we have observed a deceleration in the rate of improvements. As a result, Sematech is working not only with the re... » read more

The Week In Review: Manufacturing


As semiconductor technology becomes more challenging, expect more mergers and acquisitions in the fab tool sector. In a research report issued this week, Weston Twigg, an analyst with Pacific Crest Securities, sees several possible M&A scenarios in the future. There is no evidence that any deal is pending right now. But according to Twigg, here are some possible M&As that could happen i... » read more

DSA, Multi-beam Make Steady Progress


Semiconductor Engineering sat down to discuss current and future lithography challenges with Laurent Pain, lithography lab manager at CEA-Leti. What follows are excerpts of that conversation. SE: CEA-Leti has two major programs in lithography. One is in directed self-assembly (DSA) and the other is in multi-beam e-beam. Let’s start with multi-beam. What is Leti doing in multi-beam and what... » read more

DSA: High Stakes Game Of Alphabet Soup


By Mark LaPedus Directed self-assembly (DSA) is making progress for potential use in semiconductor production, but the industry must make some major advances in a sometimes forgotten and unsung segment—materials. DSA is a complementary patterning technology that makes use of block copolymer materials to enable fine pitches in chip designs. But today’s block copolymers based on poly (MMA... » read more

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