Getting Ready For EUV

By Jan Willis - 06 Sep, 2017 - Comments: 0

The highly anticipated introduction of extreme ultra-violet (EUV) lithography is reflected in recent surveys conducted by the eBeam Initiative, which will be presented on Sept. 11 at the annual Photomask Technology Symposium in Monterey, Calif. There are many changes are coming to the mask industry, in addition to EUV. Those include greater use of inverse-lithography technologies (ILT) and... » read more

2014 eBeam Survey Results

By eBeam Initiative - 18 Sep, 2014 - Comments: 0

An industry-wide poll highlights what the industry is thinking about EUV and mask writing at advanced nodes. To view the poll, click here. » read more

One-on-One: Naoya Hayashi

By Mark LaPedus - 20 Mar, 2014 - Comments: 0

Semiconductor Engineering sat down to discuss the current and future challenges in the photomask industry with Naoya Hayashi, research fellow at Dai Nippon Printing (DNP). SE: What are the big challenges for the photomask industry today? Hayashi: There are several challenges. Most of the challenges involve mask complexity. It is also quite difficult to handle the mask data, because it is ... » read more

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tag: mask writing

Getting Ready For EUV

2014 eBeam Survey Results

One-on-One: Naoya Hayashi