Blog Review: June 5


Cadence's Neelabh Singh provides an overview of the low power entry and exit flows in USB4 Version 2.0 link speed and how they have been simplified by making low power entry uni-directional and removing the need for certain handshakes for low power exit of the re-timers. In a podcast, Siemens' Steph Chavez chats with Daniel Beeker of NXP about the foundational importance of power distributio... » read more

Why IC Design Safety Nets Have Limits


Experts at the Table: Semiconductor Engineering sat down to discuss different responsibilities in design teams and future changes in tools with Ashish Darbari, CEO at Axiomise; Ziyad Hanna, corporate vice president R&D at Cadence; Jim Henson, ASIC verification software product manager at Siemens EDA; Dirk Seynhaeve, vice president of business development at Sigasi; Simon Davidmann, formerly... » read more

Ensuring Your Power And Ground Nets Are Correctly Connected


In most chip designs, the power and ground nets are likely your largest and most important nets. If any devices are not properly connected, then you cannot expect them to function as expected. Amongst the many problems that can occur to power and ground involves the connections to the well areas of your design that power all the bulk connections to your devices. Well regions connectivity is oft... » read more

Chip Design Digs Deeper Into AI


Growing demand for blazing fast and extremely dense multi-chiplet systems are pushing chip design deeper into AI, which increasingly is viewed as the best solution for sifting through scores of possible configurations, constraints, and variables in the least amount of time. This shift has broad implications for the future of chip design. In the past, collaborations typically involved the chi... » read more

RISC-V Heralds New Era Of Cooperation


RISC-V is paving the way for open source to become accepted within the hardware community, creating a level of industry collaboration never seen in the past, while revitalizing the connection between academia and industry. The big question is whether this arrangement is just a placeholder while the industry re-learns how to develop processors, or whether this processor architecture is someth... » read more

AI For Data Management


Data management is becoming a significant new challenge for the chip industry, as well as a brand new opportunity, as the amount of data collected at every step of design through manufacturing continues to grow. Exacerbating the problem is the rising complexity of designs, many of which are highly customized and domain-specific at the leading edge, as well as increasing demands for reliabili... » read more

Trouble Ahead For IC Verification


Verification complexity is roughly the square of design complexity, but until recently verification success rates have remained fairly consistent. That's beginning to change. There are troubling signs that verification is collapsing under the load. The first-time success rate fell (see figure 1) in the last survey conducted by Wilson Research, on behalf of Siemens EDA, in 2022. A new survey ... » read more

Distribution of Currents In Via Arrays


It has become increasingly difficult in recent years to provide adequate PDNs on a PCB. The sheer number of different voltages, combined with increased current demands, makes distributing current around the board a substantial layout challenge. This paper demonstrates that by using appropriate and accurate simulations, combined with the improved intuition that such simulations bring, it is a ch... » read more

Chip Industry Week In Review


Absolics, an affiliate of Korea materials company SKC, will receive up to $75 million in direct funding under the U.S. CHIPS Act for the construction of a 120,000 square-foot facility in Covington, Georgia, for glass substrates in advanced packaging. imec will host a €2.5 billion (~$2.72B) pilot line for researching chips beyond 2nm, partially funded through the EU Chips Act. imec CEO Luc ... » read more

A Wrap-Up Of Photomask Japan 2024


This year, I had the opportunity to attend the 30th Symposium on Photomask and NGL Mask Technology, also called Photomask Japan 2024 (PMJ), in Yokohama, Japan, from April 16 to 18. This well-regarded symposium brings together engineers from all over the world to share ideas on photomasks, NGL masks and related technologies. It was great being back to an in-person conference after four years ... » read more

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