tag: optical critical-dimension metrology

Full Wafer OCD Metrology
By Nova - 06 Jun, 2023 - Comments: 0

Authored by: Daniel Doutt*a, Ping-ju Chena, Bhargava Ravooria, Tuyen K. Trana, Eitan Rothsteinb, Nir Kampelb, Lilach Tamamb, Effi Aboodyb, Avron Gerb, Harindra Vedalac ABSTRACT Optical Critical Dimension (OCD) spectroscopy is a reliable, non-destructive, and high-throughput measurement technique for metrology and process control that is widely used in semiconductor fabrication facilities (f... » read more

Methods To Overcome Limited Labeled Data Sets In Machine Learning-Based Optical Critical Dimension Metrology
By Onto Innovation - 07 Sep, 2022 - Comments: 0

With the aggressive scaling of semiconductor devices, the increasing complexity of device structure coupled with tighter metrology error budget has driven up Optical Critical Dimension (OCD) time to solution to a critical point. Machine Learning (ML), thanks to its extremely fast turnaround, has been successfully applied in OCD metrology as an alternative solution to the conventional physical... » read more

How And Where ML Is Being Used In IC Manufacturing
By Mark LaPedus - 01 Apr, 2020 - Comments: 0

Semiconductor Engineering sat down to discuss the issues and challenges with machine learning in semiconductor manufacturing with Kurt Ronse, director of the advanced lithography program at Imec; Yudong Hao, senior director of marketing at Onto Innovation; Romain Roux, data scientist at Mycronic; and Aki Fujimura, chief executive of D2S. What follows are excerpts of that conversation. Part one ... » read more

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