The Growing Problem With Parasitic Extraction


By Ed Sperling Like everything else in semiconductor engineering at advanced process geometries, parasitic extraction is getting much more difficult at each node. There’s more circuit data to analyze, less distance between wires and much more to sort through. In addition, a 10% error in accuracy at 90nm might have been tolerable, while at 28nm it can completely change how a chip works. ... » read more

Expert Shootout: Parasitic Extraction


By Ed Sperling Low-Power Engineering sat down to discuss parasitic extraction with Robert Hoogenstryd, director of marketing for design analysis and signoff at Synopsys, and Carey Robertson, product marketing director for Calibre Design Solutions at Mentor Graphics. What follows are excerpts of that conversation. LPE: As we move into 32/28nm, are the parasitics getting worse and is it gett... » read more

The In’s And Out’s Of Parasitic Extraction


Low-Power Engineering sat down with two of the top experts—Robert Hoogenstryd, director of marketing for design analysis and signoff at Synopsys, and Carey Robertson, Calibre product marketing director at Mentor Graphics—to talk about what changes at 28nm and 22nm and why parasitic extraction is becoming so important. [youtube vid=JXnUWN1uwGQ] » read more

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