Pathfinding By Process Window Modeling: Advanced DRAM Capacitor Patterning Process Window Evaluation Using Virtual Fabrication


In advanced DRAM, capacitors with closely packed patterning are designed to increase cell density. Thus, advanced patterning schemes, such as multiple litho-etch, SADP and SAQP processes may be needed. In this paper, we systematically evaluate a DRAM capacitor hole formation process that includes SADP and SAQP patterning, using virtual fabrication and statistical analysis in SEMulator3D. The pu... » read more

Pathfinding By Process Window Modeling


In advanced DRAM, capacitors with closely packed patterning are designed to increase cell density. Thus, advanced patterning schemes, such as multiple litho-etch, SADP and SAQP processes may be needed. In this paper, we systematically evaluate a DRAM capacitor hole formation process that includes SADP and SAQP patterning, using virtual fabrication and statistical analysis in SEMulator3D®. The ... » read more

What’s Missing For Designing Chips At The System Level


Semiconductor Engineering sat down to talk about design challenges in advanced packages and nodes with John Lee, vice president and general manager for semiconductors at Ansys; Shankar Krishnamoorthy, general manager of Synopsys' Design Group; Simon Burke, distinguished engineer at Xilinx; and Andrew Kahng, professor of CSE and ECE at UC San Diego. This discussion was held at the Ansys IDEAS co... » read more

Time To Market Concerns Worsen


Time to market has always been an issue for chipmakers in highly competitive sectors, but as complexity of chips continues to grow at advanced nodes, and as markets shift increasingly toward consumer electronics, it has jumped to the No. 1 concern. Interviews with engineers at multiple levels inside of some of the largest and midsize chipmakers, conducted by Semiconductor Engineering over th... » read more

Keeping Up With Complexity


By Ed Sperling There are two schools of thought in designing complex SoCs. One says that increasing complexity requires a higher level of abstraction. The other says providing enough detail to get the design right is the only effective way to do it. There are staunch proponents of both approaches, but what has been missing are bridges to tie the higher level of abstraction to the more labo... » read more