EDA’s Hedge Plays

By Ed Sperling - 24 Jul, 2014 - Comments: 0

While 14/16nm process technologies with finFETs and double patterning have pushed complexity to new heights, the move to 10nm fundamentally will change a number of very basic elements of the design through manufacturing flow—and EDA vendors will be caught in the middle of having to make hard choices between foundries, processes, packaging approaches, and potentially which markets to serve. ... » read more

Disruptive R&D

By Paula Doe - 17 Jul, 2014 - Comments: 0

Leading university researchers presented their most promising technologies — describing developments ranging from sustainable metal cluster technology (that’s already spawned three notable startups) to resonance-based detection for more accurate MEMS devices — at the new Breakthrough Research Technologies session and the Silicon Innovation Forum at SEMICON West 2014. OSU metal cluster... » read more

Semiconductor R&D Crisis Ahead?

By Ed Sperling - 26 Jun, 2014 - Comments: 0

Listen to engineering management at chipmakers these days and a consistent theme emerges: They’re all petrified about where to place their next technology bets. Do they move to 14/16nm finFETs with plans to shrink to 10nm, 7nm and maybe even 5nm? Do they invest in 2.5D and 3D stacked die? Or do they eke more from existing process nodes using new process technologies, more compact designs and ... » read more

Imec Launches R&D Tool Hub

By Mark LaPedus - 04 Jun, 2014 - Comments: 1

The semiconductor industry is entering yet another inflection point. Consumers want faster mobile systems with more functions. So, chipmakers are under pressure to deliver new and low-power chips that are smaller and faster. The problem is that IC design and chip manufacturing costs continue to escalate. These costs, in turn, are fueling an ongoing shakeout in the chip and fab tool industrie... » read more

VLSI Kyoto – The SOI Papers

By Various Writers - 19 Jun, 2013 - Comments: 0

By Adele Hars There were some breakthrough FD-SOI and other excellent SOI-based papers that came out of the 2013 Symposia on VLSI Technology and Circuits in Kyoto (June 10-14, 2013). By way of explanation, VSLI comprises two symposia: one on Technology; one on Circuits. However, papers that are relevant to both were presented in “Jumbo Joint Focus” sessions. The papers should all b... » read more

FinFET Isolation: Bulk vs. SOI

By Various Writers - 15 May, 2013 - Comments: 1

Terry Hook of IBM recently contributed an article to ASN about FinFET isolation issues on bulk vs. SOI. It generated immense interest, and created lots of discussion on various LinkedIn groups. In case you missed it, here it is again. (This article is based on an in-depth presentation Terry gave at the SOI Consortium's Fully-Depleted Tech Workshop, held during VLSI-TSA in Taiwan, April 2... » read more

SOI Highlights at Common Platform Tech Forum

By Various Writers - 19 Feb, 2013 - Comments: 0

Posted by Adele Hars, Editor-in-Chief, Advanced Substrate News ~ ~ The 2013 Common Platform Technology Forum showcased “the latest technological advances being delivered to the world’s leading electronics companies,” so of course SOI-based topics were well-represented. Happily, those of us who weren’t able to get over to Silicon Valley were able to attend “virtually” via a ... » read more

Wafer Leaders Extend Basis for Global SOI Supply

By Various Writers - 16 Oct, 2012 - Comments: 0

Posted by Adele Hars, Editor-in-Chief, Advanced Substrate News ~ ~ It’s a bright green light from the world leaders in SOI wafer capacity. Soitec, the world leader in SOI wafer production, and long-time partner Shin-Etsu Handatai (SEH), the world’s biggest producer of silicon wafers, have extended their licensing agreement and expanded their technology cooperation. SEH is a $12... » read more

Leti Looks at Using Strain with FD-SOI for High-Perf Apps

By Various Writers - 29 Jun, 2012 - Comments: 0

The researchers at Leti working on FD-SOI have extremely deep expertise in it. One of the areas they've looked at is performance boosters. With the interest in FD-SOI rapidly increasing on the heels of the recent ST-GF announcement, their work becomes even more timely. A key Leti team wrote a summary of some recent strain work, which first appeared as part of the Advanced Substra... » read more

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Knowledge Centers
Entities, people and technologies explored

Shift Left Is The Tip Of The Iceberg

A transformative change is underway for semiconductor design and EDA. New languages, models, and abstractions will need to be created.

by Brian Bailey

Partitioning In The Chiplet Era

Understanding how chiplets interact under different workloads is critical to ensuring signal integrity and optimal performance in heterogeneous designs.

by Ann Mutschler

3.5D: The Great Compromise

Pros and cons of a middle-ground chiplet assembly that combines 2.5D and 3D-IC.

by Ed Sperling

AI’s Role In Chip Design Widens, Drawing In New Startups

Focus is on letting engineers do much more with the same or fewer resources — and less drudgery.

by Karen Heyman

Key Technologies To Extend EUV To 14 Angstroms

Alongside high-NA EUV will be better-performing photoresists, reduced roughness using passivation and etch, and lateral etching to reduce tip-to-tip dimensions.

by Laura Peters

What Comes After HBM For Chiplets

The standard for high-bandwidth memory limits design freedom at many levels, but that is required for interoperability. What freedoms can be taken from other functions to make chiplets possible?

by Brian Bailey

Memory Fundamentals For Engineers

eBook: Nearly everything you need to know about memory, including detailed explanations of the different types of memory; how and where these are used today; what's changing, which memories are successful and which ones might be in the future; and the limitations of each memory type.

by The SE Staff

Why Small Fab And Assembly Houses Are Thriving

Megafabs churning out the most advanced processors are not the only game in town.

by Bryon Moyer

tag: R&D