Research Bits: Aug. 20


EUV mirror interference lithography Researchers from the Paul Scherrer Institute developed an EUV lithography technique that can produce conductive tracks with a separation of just five nanometers by exposing the sample indirectly rather than directly. Called EUV mirror interference lithography (MIL), the technique uses two mutually coherent beams that are reflected onto the wafer by two id... » read more

Research Bits: May 21


Lithium tantalate PICs Researchers at EPFL and Shanghai Institute of Microsystem and Information Technology developed scalable photonic integrated circuits (PICs) based on lithium tantalate (LiTaO3). Lithium tantalate can provide excellent electro-optic qualities and is used in telecom 5G RF filters. The team developed a wafer-bonding method for lithium tantalate, which is compatible with s... » read more

Manufacturing Bits: Dec. 23


Gallium oxide transistors At the recent IEEE International Electron Devices Meeting (IEDM), Cornell University and Hosei University presented a paper on a gallium oxide vertical transistor with a record breakdown voltage. Crystalline beta gallium oxide is a promising wide bandgap semiconductor material, which is used for power semiconductor applications. Gallium oxide has a large bandgap of... » read more