Analysis And Design Of Dual-Layer TFTs (Oregon State Univ., Applied Materials)


A new technical paper titled "Dual-Layer Thin-Film Transistor Analysis and Design" was published by researchers at Oregon State University and Applied Materials. Abstract "A set of analytical equations is formulated for the analysis and design of a dual-layer thin-film transistor (TFT). For a given TFT structure, in which each channel layer thickness is specified, drain current is calculate... » read more

CMOS Compatible Materials With Quantum Defects Suitable For Room Temperature Applications


A technical paper titled “Thin Film Materials for Room Temperature Quantum Applications” was published by researchers at Marquette University. Abstract: "Thin films with quantum defects are emerging as a potential platform for quantum applications. Quantum defects in some thin films arise due to structural imperfections, such as vacancies or impurities. These defects generate localized el... » read more

An Eco-Friendly Conductive Ink For Thin-Film Electronics


A technical paper titled “Recyclable Thin-Film Soft Electronics for Smart Packaging and E-Skins” was published by researchers at Carnegie Mellon University and University of Coimbra. Abstract: Despite advances in soft, sticker-like electronics, few efforts have dealt with the challenge of electronic waste. Here, this is addressed by introducing an eco-friendly conductive ink for thin-film... » read more

Stabilizing A Hafnium Oxide-Based Thin Film When Sandwiched Between A Metal Substrate And An Electrode


A technical paper titled "Origin of Ferroelectric Phase Stabilization via the Clamping Effect in Ferroelectric Hafnium Zirconium Oxide Thin Films" was published by researchers at University of Virginia, Brown University, Sandia National Labs, and Oak Ridge National Lab. Funding was given by U.S. DOE's 3D Ferroelectric Microelectronics Energy Frontier Research Center and the SRC. "This study ... » read more

Metrology Of Thin Resist For High NA EUVL


One of the many constrains of high numerical aperture extreme ultraviolet lithography (High NA EUVL) is related to resist thickness. In fact, one of the consequences of moving from current 0.33NA to 0.55NA (high NA) is the depth of focus (DOF) reduction. In addition, as the resist feature lines shrink down to 8nm half pitch, it is essential to limit the aspect ratio to avoid pattern collapse. T... » read more

OBJTs (Organic Bipolar Transistors) Based on Crystalline Rubrene Thin Films


New technical paper titled "Organic bipolar transistors" from researchers at Technische Universität Dresden, NanoP, Technische Hochschule Mittelhessen, University of Applied Science, and ALBA Synchrotron. Abstract (Partial) "Here we present organic bipolar transistors with outstanding device performance: a previously undescribed vertical architecture and highly crystalline organic rubrene ... » read more

MIT Researchers Create Thin-Film Speakers


New academic paper from MIT, "An Ultra-Thin Flexible Loudspeaker Based on a Piezoelectric Micro-Dome Array." Abstract: "Ultra-thin, lightweight, high-performance, low-cost and energy-efficient loudspeakers that can be deployed over a wide area have become increasingly attractive to both traditional audio systems and emerging applications such as active noise control and immersive entertainm... » read more

Investigation of the Resistivity and Emissivity of a Pellicle Membrane for EUV Lithography


New technical paper from Hanyang University and University of Texas at Dallas. Abstract "A pellicle is a thin membrane structure that protects an extreme ultraviolet (EUV) mask from contamination during the exposure process. However, its limited transmittance induces unwanted heating owing to the absorption of EUV photons. The rupture of the EUV pellicle can be avoided by improving its ther... » read more

Neuromorphic chip integrated with a large-scale integration circuit and amorphous-metal-oxide semiconductor thin-film synapse devices


New academic paper from Nara Institute of Science and Technology (NAIST) and Ryukoku University. Abstract "Artificial intelligences are promising in future societies, and neural networks are typical technologies with the advantages such as self-organization, self-learning, parallel distributed computing, and fault tolerance, but their size and power consumption are large. Neuromorphic syste... » read more

Thin Film Characterization For Advanced Patterning


Authors: Zhimin Zhu; Xianggui Ye; Sean Simmons; Catherine Frank; Tim Limmer; James Lamb Brewer Science, Inc. (United States) A variable-angle spectroscopic ellipsometer (VASE) is an essential tool for measuring the thickness of a thin film, as well as its n and k optical parameters. However, for films thinner than 10 nm, precise measurement is very challenging. In this paper, the root cause... » read more

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