Metrology Advances Step Up To Sub-2nm Device Node Needs


Metrology and inspection are dealing with a slew of issues tied to 3D measurements, buried defects, and higher sensitivity as device features continue to shrink to 2nm and below. This is made even more challenging due to increasing pressure to ramp new processes more quickly. Metrology tool suppliers must exceed current needs by a process node or two to ensure solutions are ready to meet tig... » read more

CMP Process Characterization Using White Light Interferometry


Faster computer and electronic processors require smaller features for integrated circuits (IC), which in turn require smaller and smoother substrate surfaces. Chemical mechanical polishing (CMP) has become one of the most critical semiconductor fabrication technologies because it offers a superior means of removing unwanted topography in interlevel dielectric layers and achieving sufficient pl... » read more

SiC Growth For EVs Is Stressing Manufacturing


The electrification of vehicles is fueling demand for silicon carbide power ICs, but it also is creating challenges in finding and identifying defects in those chips. Coinciding with this is a growing awareness about just how immature SiC technology is and how much work still needs to be done — and how quickly that has to happen. Automakers are pushing heavily into electric vehicles, and t... » read more

Advantages Of Measuring Surface Roughness With White Light Interferometry


The concept of measuring surface roughness originated nearly a century ago as a means to prevent uncertainty and disputes between manufacturers and buyers. Now, it has become a common identifier used throughout industry for validating manufacturing processes, confirming adherence to both internal and regulatory specifications, and guaranteeing quality and performance of end products. Subjective... » read more

Characterization Of CMP Processes With White Light Interferometry


Faster computer and electronic processors require smaller features for integrated circuits (IC), which in turn require smaller and smoother substrate surfaces. Chemical mechanical polishing (CMP) has become one of the most critical semiconductor fabrication technologies because it offers a superior means of removing unwanted topography in interlevel dielectric layers and achieving sufficient pl... » read more