June 2012 - Page 3 of 6 - Semiconductor Engineering


Fallback Plans


By Ann Steffora Mutschler With EUV lithography missing a few deadlines already, the semiconductor industry has begun to search for alternatives. None of these solutions is simple, of course, and it’s questionable whether they’re even economically viable. And even if EUV is ready for mass production by 14nm, there are new challenges that have to be dealt with—particularly in the space... » read more

Foundries Going Greener


The ongoing push towards green and energy-efficient systems is prompting the silicon foundries to jump on the bandwagon and devise their next-generation processes based on ultra-high voltage technology. For some time, several foundries have offered 1- and 0.5-micron, ultra-high voltage processes with ratings up to 800 volts. But seeking to get a jump for the next wave of designs, the special... » read more

Challenges Mount For Interconnect


By Mark LaPedus There are a plethora of chip-manufacturing challenges for the 20nm node and beyond. When asked what are the top challenges facing leading-edge chip makers today, Gary Patton, vice president of the Semiconductor Research and Development Center at IBM, said it boils down to two major hurdles: lithography and the interconnect. The problems with lithography are well documented.... » read more

Fabless-Foundry Model Under Stress


By Mark LaPedus The semiconductor roadmap was once a smooth and straightforward path, but chipmakers face a bumpy and challenging ride as they migrate to the 20nm node and beyond. Among the challenges seen on the horizon are the advent of 3D stacking, 450mm fabs, new transistor architectures, multi-patterning, and the questionable availability of extreme ultraviolet (EUV) lithography. ... » read more

How Firm Is Firmware?


By Frank Schirrmeister When blogging recently about Xilinx’s presentation at the Cadence DAC 2012 EDA360 theater, which was given by Dave Beal, I ran across the diagram he had used to outline the “development stack” from hardware to software. Dave had described a virtual prototype to the audience as a functional model that recreates the WHAT rather than the HOW, duplicating the result ... » read more

The Challenges Of 28nm HKMG


28nm Super Low Power (28nm-SLP) is the low power CMOS offering delivered on a bulk silicon substrate for mobile consumer and digital consumer applications. This technology has four Vt's (high, regular, low and super low) for design flexibility with multi-channel length capability and offers the ultimate in small die size and low cost. Multiple SRAM bit cells for high density and high-performanc... » read more

Model-Based Double-Dipole Lithography For Sub-30nm Node Device


As the optical lithography advances into the sub-30nm technology node, the various candidates of lithography have been discussed. Double dipole lithography (DDL) has been a primary lithography candidate due to the advantages of a simpler process and a lower mask cost compared to the double patterning lithography (DPL). However, new DDL requirements have been also emerged to improve the process ... » read more

The Future Of Manufacturing


Semiconductor Manufacturing & Design's Mark LaPedus talks with Randhir Thakur, general manager of Applied Materials' Silicon Systems Group, about what's changing in the foundries, in the equipment necessary to create ICs, and in the structures and materials used in those ICs. [youtube vid=y_b5G6J6UwU] » read more

Bucket Lists


At 130nm, the introduction of copper interconnects, 300mm wafers and low-k dielectrics left the entire supply chain breathless. There had never been as many changes at a single process node in the history of semiconductors. At 28nm, the number of changes will pale compared to what’s necessary at 20nm, and that will pale to what’s required at 14nm. But unlike 130nm, when most of those cha... » read more

What’s ST’s FD-SOI Technology All About?


As I blogged here on SemiMD last week, STMicroelectronics has announced that to supplement in-house production at their fab in Crolles, the company has tapped GlobalFoundries for high-volume production of 28nm then 20nm FD-SOI mobile devices.  ST will also open access to its FD-SOI technology to GlobalFoundries’ other customers.  High-volume manufacturing will kick off with ST-Ericsson’s ... » read more

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