How ALD compares with CVD, PECVD, and how it matches up with ALE.
Imagine being able to deposit a film of material just a few atomic layers at a time. As impossible as that sounds, atomic layer deposition (ALD) is a reality. In fact, it’s being used in an ever-increasing number of applications as an extremely precise and controllable process for creating thin films. Together with its etch counterpart – atomic layer etching (ALE) – ALD is enabling the use of new materials and three-dimensional designs in advanced chip manufacturing. In this Tech Brief, we’ll take a closer look at this important atomic-scale process.
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