A Look At Atomic Layer Deposition

How ALD compares with CVD, PECVD, and how it matches up with ALE.


Imagine being able to deposit a film of material just a few atomic layers at a time. As impossible as that sounds, atomic layer deposition (ALD) is a reality. In fact, it’s being used in an ever-increasing number of applications as an extremely precise and controllable process for creating thin films. Together with its etch counterpart – atomic layer etching (ALE) – ALD is enabling the use of new materials and three-dimensional designs in advanced chip manufacturing. In this Tech Brief, we’ll take a closer look at this important atomic-scale process.

To read more, click here.

Leave a Reply

(Note: This name will be displayed publicly)