Chip Industry Week In Review
By The SE Staff - 25 Oct, 2024 - Comments: 0

Europe's top court ruled in Intel's favor, voiding a $1.1 billion fine imposed by the European Union and dismissing charges of anti-competitive behavior. IBM released yield benchmarks for high-NA EUV, which serve as proof points that the newest advanced litho equipment will enable scaling beyond the 2nm process node. Also on the lithography front, Nikon is developing a maskless digital litho... » read more

Tuning Design And Process For High-NA EUV Stitching
By Kevin Lucas - 24 Oct, 2024 - Comments: 0

By Kevin Lucas and James Ban Upcoming 14A and 10A process nodes will use high-NA EUV anamorphic scanners, which will require two stitched half-fields to achieve the equivalent wafer exposure area of previous-generation scanners, see figure 1. The lithography patterning at a stitching boundary between two mask exposures will be affected by additional process variation than are encountered in ... » read more

Metal-Oxide-Metal Capacitor Simulation And Modeling By Virtual Fabrication
By Qingpeng Wang - 24 Oct, 2024 - Comments: 0

Metal-Oxide-Metal (MOM) capacitors are passive radio frequency (RF) capacitive devices that are a common component in semiconductor logic chips [1]. A SPICE model of a MOM capacitor is typically used by designers during the design and performance evaluation of logic chip RF circuitry. Traditionally, it may take at least 3 months from the completion of the design layout, wafer fabrication, final... » read more

Advanced Packaging Driving New Collaboration Across Supply Chain
By Gregory Haley - 24 Oct, 2024 - Comments: 0

The semiconductor industry is undergoing a profound shift in packaging technologies to ones that rely on close collaboration among multiple stakeholders to solve intricate, multi-faceted, and extraordinarily complex problems. At the heart of this change is the convergence of heterogeneous integration, chiplets, and 3D stacking. Heterogeneous approaches allow companies to combine different te... » read more

Luminary Panel Sees Multi-Beam Mask Writers And Curvilinear Masks Key To 193i And EUV
By Jan Willis - 24 Oct, 2024 - Comments: 0

Attendance was up and the mood was optimistic at this year’s SPIE Photomask and EUV conference held September 29 through October 3, 2024. The optimism was apparent as well for multi-beam mask writers and curvilinear masks during the eBeam Initiative’s 15th annual reception and meeting held on October 1. In the eBeam Initiative’s annual Luminaries survey, 93% of those surveyed said that pu... » read more

Unveiling the Stability of Proper Polyethyleneimine-Functionalized Carbon Nanotube Composites-Derived Chemiresistive CO2 Sensors
By Brewer Science - 24 Oct, 2024 - Comments: 0

A technical paper titled "Unveiling the Stability of Proper Polyethyleneimine-Functionalized Carbon Nanotube Composites-Derived Chemiresistive CO2 Sensors" was published by researchers at Brewer Science. Abstract "Branched polyethyleneimine (PEI), consisting of numerous imine groups, is employed for CO2 gas detection, attributed to the interaction between imine groups and CO2. Incorporatin... » read more

Revolutionizing IC Packaging With High-Density RDL Technology
By Curtis Zwenger - 24 Oct, 2024 - Comments: 0

The demand for high-performance devices, particularly in AI, HPC, and data centers, has surged dramatically in the ever-evolving landscape of integrated circuit technology. This demand has been further accelerated by the COVID-19 pandemic, pushing the boundaries of silicon technology to its limits. Enter Amkor’s S-SWIFT, a packaging solution designed to address these challenges and revolution... » read more

Multi-Tier Die Stacking Enables Efficient Manufacturing
By Jessica Albright - 24 Oct, 2024 - Comments: 0

Advanced packaging is currently facing a critical challenge to increase manufacturing efficiency without sacrificing device performance. Vertical integration techniques, such as multi-tier die stacking and hybrid bonding, enable increased integration density, therefore improving yield of high-quality devices. However, these highly precise processes require significant attention to defectivity... » read more

New Approaches To Power Decoupling
By Bryon Moyer - 24 Oct, 2024 - Comments: 0

Decoupling capacitors have long been an important aspect of maintaining a clean power source for integrated circuits, but with noise caused by rising clock frequencies, multiple power domains, and various types of advanced packaging, new approaches are needed. Power is a much more important factor than it used to be, especially in the era of AI. “Doing an AI search consumes 10X the power t... » read more

Reduce Augmented Reality Device Time-to-Market by Bringing Manufacturing Impact to Optical Simulation
By Synopsys - 24 Oct, 2024 - Comments: 0

Disruptive AR systems will push the limits of optics: limits in design, limits in manufacturing, and limits in overall system integration. The trend of optical components being integrated into more complex miniaturized systems is impacting optical software. Optical design software has been around for decades to design, simulate, and analyze any optical component from lenses and mirrors to light... » read more

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