AI Pushes High-End Mobile From SoCs To Multi-Die


Advanced packaging is becoming a key differentiator for the high end of the mobile phone market, enabling higher performance, more flexibility, and faster time to market than systems on chip. Monolithic SoCs likely will remain the technology of choice for low-end and midrange mobile devices because of their form factor, proven record, and lower cost. But multi-die assemblies provide more fle... » read more

AI: A New Tool For Hackers, And For Preventing Attacks


Semiconductor Engineering sat down to discuss hardware security challenges, including new threat models from AI-based attacks, with Nicole Fern, principal security analyst at Keysight; Serge Leef, AI-For-Silicon strategist at Microsoft; Scott Best, senior director for silicon security products at Rambus; Lee Harrison, director of Tessent Automotive IC Solutions at Siemens EDA; Mohit Arora, seni... » read more

6G Adoption Rollout Will Be A Patchwork At First


6G is expected to begin rolling out in 2030, but advances in 5G will inch cellular technology close enough that it will make the first 6G implementations seem more like just another upgrade. That's just the starting point, though. 6G technology gets much more interesting from there, connecting more devices at a significantly higher data rate, and enabling services that would be unattractive to ... » read more

Mixed Messages Complicate Mixed-Signal


Several years ago, analog and mixed signal (AMS) content hit a wall. Its contribution to first-time chip failure doubled, and there is no evidence that anything has improved dramatically since then. Some see that the problem is likely to get worse due to issues associated with advanced nodes, while others see hope for improvement coming from AI or chiplets. Fig. 1: Cause of ASIC respins. S... » read more

Distributing Intelligence Inside Multi-Die Assemblies


The shift from SoCs to multi-die assemblies requires more and smarter controllers to be distributed throughout a package in order to ensure optimal performance, signal integrity, and no downtime. In planar SoCs, many of these kinds of functions are often managed by a single CPU or MCU. But as logic increasingly is decomposed into chiplets, connected to each other and memories by TSVs, hybrid... » read more

Security Vulnerabilities Difficult To Detect In Verification Flow


As designs grow in complexity and size, the landscape for potential hackers to infiltrate a chip at any point in either the design or verification flow increases commensurately. Long considered to be a “safe” aspect of the design process, verification now must be a focus of chip developers from a security perspective. This also means the concept of trust has never been higher, and the tr... » read more

Disruptive Changes Ahead For Photomasks?


Experts at the Table: Semiconductor Engineering sat down with four experts to explore the current state and future direction of mask-making, with insights from Harry Levinson, principal lithographer at HJL Lithography; Aki Fujimura, CEO of D2S; Ezequiel Russell, senior director of mask technology at Micron; and Christopher Progler, executive vice president and CTO at Photronics. What follows ... » read more

Power Delivery Challenges For AI Chips


As artificial intelligence (AI) workloads grow larger and more complex, the various processing elements being developed to process all that data are demanding unprecedented levels of power. But delivering this power efficiently and reliably, without degrading signal integrity or introducing thermal bottlenecks, has created some of the toughest design and manufacturing challenges in semiconducto... » read more

Physics Limits Interposer Line Lengths


Electrical interposers provide a convenient surface for mounting multiple chips within a single package, but even though interposer lines theoretically can be routed anywhere, insertion losses limit their practical length. Lines on interposers — and on silicon interposers in particular — can be exceedingly narrow. Having a small cross-section makes such lines resistive, degrading signals... » read more

Are Larger Reticle Sizes On The Horizon?


Making high-NA EUV lithography work will take a manufacturing-worthy approach to stitching together circuits or a wholesale change to larger masks. Circuit stitching between the exposure fields is challenging the design, yield and manufacturability of the high-NA (0.55) EUV transition. The alternative is a radical change from 6x6-inch to 6x11-inch masks that would eliminate stitching, but it... » read more

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