Home
TECHNICAL PAPERS

Ferroelectric, hafnium oxide based transistors for digital beyond von-Neumann computing

HfO2-based FeFETs: challenges & mitigation strategies

popularity

Source: AIP Applied Physics Letters, published 2/4/2021.

  • 1Nanoelectronic Materials Laboratory (NaMLab) gGmbH, 01187 Dresden, Germany
  • 2Chair of Nanoelectronics, TU Dresden, 01187 Dresden, Germany

 

Technical paper link is here



Leave a Reply


(Note: This name will be displayed publicly)