Ferroelectric, hafnium oxide based transistors for digital beyond von-Neumann computing
HfO2-based FeFETs: challenges & mitigation strategies
Source: AIP Applied Physics Letters, published 2/4/2021.
Evelyn T. Breyer1, Halid Mulaosmanovic1, Thomas Mikolajick1,2, and Stefan Slesazeck1
- 1Nanoelectronic Materials Laboratory (NaMLab) gGmbH, 01187 Dresden, Germany
- 2Chair of Nanoelectronics, TU Dresden, 01187 Dresden, Germany
Technical paper link is here
Leave a Reply