A new technical paper titled “Scanning electron microscopy-based automatic defect inspection for semiconductor manufacturing: a systematic review” was published by researchers at KU Leuven and imec.
“We identified, categorized, and discussed automatic defect inspection algorithms that analyze scanning electron microscopy (SEM) images for semiconductor manufacturing (SM). This is a topic of critical importance for the SM industry as the continuous shrinking of device patterns has led to increasing defectivity and a greater prevalence of higher-resolution imaging tools such as SEM,” states the paper.
Find the open access paper here.. May 2025.
Dehaerne, Enrique, Bappaditya Dey, Victor Blanco, and Jesse Davis. “Scanning electron microscopy-based automatic defect inspection for semiconductor manufacturing: a systematic review.” Journal of Micro/Nanopatterning, Materials, and Metrology 24, no. 2 (2025): 020901-020901.
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