Refining Vision-Language Models For Lithography Defect Detection


Researchers from Hanyang University, Korea University, and Korea Institute of Industrial Technology have published “Failure-Aware Refinement of Vision-Language Model for Lithography Defect Detection”. Abstract “Semiconductor lithography inspection requires reliable detection of small pattern defects such as bridge, burr, pinch, and contamination. In this study, we propose ... » read more

Through The Glass: Why The Rapid Development Of TGV Demands Rigorous Analysis


The drive for increased performance is enticing some advanced packaging manufacturers to transition from traditional organic substrates to glass core substrates, a switch that comes with numerous benefits. Compared to organic substrates, glass core offers superior mechanical strength, is better suited for large package sizes, provides improved electrical properties, and has the ability to meet ... » read more

Grouping Complex Wafer Defect Patterns Into Meaningful Clusters (Oregon State Univ., Micron)


A new technical paper titled "DECOR: Deep Embedding Clustering with Orientation Robustness" was published by researchers at Oregon State University and Micron Technology. Abstract "In semiconductor manufacturing, early detection of wafer defects is critical for product yield optimization. However, raw wafer data from wafer quality tests are often complex, unlabeled, imbalanced and can conta... » read more

Overview Of 103 Research Papers On Automatic SEM Image Analysis Algorithms For Semiconductor Defect Inspection (KU Leuven, Imec)


A new technical paper titled "Scanning electron microscopy-based automatic defect inspection for semiconductor manufacturing: a systematic review" was published by researchers at KU Leuven and imec. "We identified, categorized, and discussed automatic defect inspection algorithms that analyze scanning electron microscopy (SEM) images for semiconductor manufacturing (SM). This is a topic of c... » read more

Inspection, Metrology Issues In Advanced Packages


Experts at the Table: Semiconductor Engineering sat down to talk about how to inspect and measure smaller features across large areas in advanced packaging, with Frank Chen, director of applications and product management at Bruker Nano Surfaces & Metrology; John Hoffman, computer vision engineering manager at Nordson Test & Measurement; and Jiangtao Hu, senior technology director at O... » read more

A Framework For Improving Current Defect Inspection Techniques For Advanced Nodes


A technical paper titled “Improved Defect Detection and Classification Method for Advanced IC Nodes by Using Slicing Aided Hyper Inference with Refinement Strategy” was published by researchers at Ghent University, imec, and SCREEN SPE. Abstract: "In semiconductor manufacturing, lithography has often been the manufacturing step defining the smallest possible pattern dimensions. In recent ... » read more