Process Model Calibration: Building Predictive and Accurate 3D Process Models

Reflecting actual process behavior and displaying realistic 3D visualizations of complex process flows.


The semiconductor industry has always faced challenges caused by device scaling, architecture evolution and process complexity and integration. These challenges are coupled with a need to provide new technology to the market quickly. In the initial stages of semiconductor technology development, innovative process flow schemes must be tested using silicon test wafers. These wafer tests are lengthy and costly.

As an alternative, process engineers and integrators can use virtual process modeling to test alternative process schemes and architectures without relying on wafer-based testing. However, it can be challenging to build a virtual process model that can accurately replicate an actual process flow. One important aspect of building an accurate process model is to ensure that the model is calibrated. Having a calibrated model is important, since it provides assurance to the process integrators and engineers that the model will reflect actual process behavior. A calibrated model can also display realistic 3D visualizations of complex process flows and provide accurate results during process window studies and design technology co-optimization.

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